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Calculation of Pore Size Distribution in the Ellipsometric Porosimetry: Method and Reliability

Published online by Cambridge University Press:  10 February 2011

K. P Mogilnikov ,
V. G Polovinkin ,
F. N Dultsev  and
M. R Baklanov
K. P Mogilnikov
Affiliation:
Institute of Semiconductor Physics SB RAS, 630090 Novosibirsk, Russia
V. G Polovinkin
Affiliation:
Institute of Semiconductor Physics SB RAS, 630090 Novosibirsk, Russia
F. N Dultsev
Affiliation:
Institute of Semiconductor Physics SB RAS, 630090 Novosibirsk, Russia
M. R Baklanov
Affiliation:
IMEC, B-3001 Leuven, Belgium, baklanov@imec.be
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Abstract

Ellipsometric porosimetry allows measurement of the pore size distribution in a thin porous film deposited on top of any solid substrate. The most important concept of this technique is the use of in-situ ellipsometry to determine the amount of adsorbate adsorbed/condensed in the film. Changes in refractive index and film thickness are used for calculation of the amount of adsorbate. A room temperature porosimetry based on adsorption of vapours of some organic solvents has been developed. In this paper, a method of calculation of the pore size distribution and reliability of the ELP results is discussed and the validity of the Gurvitsch rule for organic adsorbates (toluene, heptane, CCl4) is examined. Porous silica films on top of Si wafers were used for this analysis.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 565: Symposium O – Low-Dielectric Constant Materials V , 1999 , 81
Copyright
Copyright © Materials Research Society 1999

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