Crossref Citations
This article has been cited by the following publications. This list is generated based on data provided by
Crossref.
Park, Daehyun
and
Jeon, Dongryul
2012.
Eutectic alloy electrode for rigid and low resistance carbon nanotube contact.
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena,
Vol. 30,
Issue. 6,
McEvoy, Niall
Peltekis, Nikolaos
Kumar, Shishir
Rezvani, Ehsan
Nolan, Hugo
Keeley, Gareth P.
Blau, Werner J.
and
Duesberg, Georg S.
2012.
Synthesis and analysis of thin conducting pyrolytic carbon films.
Carbon,
Vol. 50,
Issue. 3,
p.
1216.
Duesberg, Georg S.
Kim, Hye-Young
Lee, Kangho
McEvoy, Niall
Winters, Sinead
and
Yim, Chanyoung
2013.
Investigation of carbon-silicon schottky diodes and their use as chemical sensors.
p.
85.
Huebner, Sebastian
Miyakawa, Natsuki
Pahlke, Andreas
and
Kreupl, Franz
2015.
Design and properties of low-energy X-ray transmission windows based on graphenic carbon.
physica status solidi (b),
Vol. 252,
Issue. 11,
p.
2564.
Alnassar, Mohammad Saleh N
Leech, Patrick W.
Reeves, Geoff K.
Holland, Anthony S.
Lau, Desmond W. M.
McCulloch, Dougal G.
Tran, Hiep N.
and
Partridge, Jim G.
2015.
Graphitic Schottky Contacts to Si formed by Energetic Deposition.
MRS Proceedings,
Vol. 1786,
Issue. ,
p.
51.
Huebner, Sebastian
Miyakawa, Natsuki
Pahlke, Andreas
and
Kreupl, Franz
2016.
Performance Improvement of Graphenic Carbon X-ray Transmission Windows.
MRS Advances,
Vol. 1,
Issue. 20,
p.
1441.
Tran, Hiep
Kracica, Masturina
McCulloch, Dougal
Mayes, Edwin
Holland, Anthony
and
Partridge, James
2017.
Energetic deposition, measurement and simulation of graphitic contacts to 6H-SiC.
Microelectronics Reliability,
Vol. 71,
Issue. ,
p.
82.
Stelzer, Max
Jung, Moritz
and
Kreupl, Franz
2017.
Graphenic Carbon: A Novel Material to Improve the Reliability of Metal-Silicon Contacts.
IEEE Journal of the Electron Devices Society,
Vol. 5,
Issue. 5,
p.
416.
Stelzer, M.
Jung, M.
Wurstbauer, U.
Holleitner, A.W.
and
Kreupl, F.
2018.
Low Temperature Sputtered Graphenic Carbon Enables Highly Reliable Contacts to Silicon.
p.
11.2.1.
Ott, A K
Dou, C
Sassi, U
Goykhman, I
Yoon, D
Wu, J
Lombardo, A
and
Ferrari, A C
2018.
Tetrahedral amorphous carbon resistive memories with graphene-based electrodes.
2D Materials,
Vol. 5,
Issue. 4,
p.
045028.
Alnassar, M.S.N.
Luong, S.
Tran, H.N.
Partridge, J.G.
and
Holland, A.S.
2018.
Simulation of graphitic contacts to p‐type Si using a metal‐resistor‐semiconductor (M‐R‐S) model implemented in TCAD.
International Journal of Numerical Modelling: Electronic Networks, Devices and Fields,
Vol. 31,
Issue. 3,
Stelzer, Max
Jung, Moritz
Wurstbauer, Ursula
Holleitner, Alexander
and
Kreupl, Franz
2019.
Highly Reliable Contacts to Silicon Enabled by Low Temperature Sputtered Graphenic Carbon.
IEEE Journal of the Electron Devices Society,
Vol. 7,
Issue. ,
p.
252.
Furio, A
Stelzer, M
Jung, M
Neitzert, H C
and
Kreupl, F
2019.
Graphenic carbon as etching mask: patterning with laser lithography and KOH etching.
Journal of Physics: Conference Series,
Vol. 1226,
Issue. 1,
p.
012011.