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Characterization of High Surface Area Silicon Oxynitrides

Published online by Cambridge University Press:  25 February 2011

Peter W. Lednor ,
Rene De Ruiter  and
Kees A. Emeis
Peter W. Lednor
Affiliation:
Koninklijke/Shell-Laboratorium, Amsterdam (Shell Research B.V.), Badhuisweg 3, 1031 CM Amsterdam, The Netherlands
Rene De Ruiter
Affiliation:
Koninklijke/Shell-Laboratorium, Amsterdam (Shell Research B.V.), Badhuisweg 3, 1031 CM Amsterdam, The Netherlands
Kees A. Emeis
Affiliation:
Koninklijke/Shell-Laboratorium, Amsterdam (Shell Research B.V.), Badhuisweg 3, 1031 CM Amsterdam, The Netherlands
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Abstract

High surface area silicon oxynitrides have been prepared by nitrida- tion of silica with ammonia. Characterization by Fourier-transform infrared spectroscopy has allowed quantitative determination of hydroxyl, amido and imido groups. Data obtained by X-ray photoelectron spectroscopy show that the nitrogen is well distributed in the surface of the materials.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 271: Symposium N – Better Ceramics Through Chemistry V , 1992 , 801
Copyright
Copyright © Materials Research Society 1992

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References

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