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Characterization of Surface Roughness in Thin Films and Small Particles

Published online by Cambridge University Press:  26 February 2011

R. Silva ,
J.G. Perez-Ramirez ,
D. Romeu ,
R. Herrera ,
R. Perez  and
M. Jose Yacaman
R. Silva
Affiliation:
Centro Regional de Investigaciones Básicas y Aplicadas de Bahía Blanca. Bahia Blanca Argentina.
J.G. Perez-Ramirez
Affiliation:
Instituto de Física, UNAM. Apartado Postal 20-364 Deleg. Alvaro Obregón 01000, México D.F.
D. Romeu
Affiliation:
Instituto de Física, UNAM. Apartado Postal 20-364 Deleg. Alvaro Obregón 01000, México D.F.
R. Herrera
Affiliation:
Instituto de Física, UNAM. Apartado Postal 20-364 Deleg. Alvaro Obregón 01000, México D.F.
R. Perez
Affiliation:
Instituto de Física, UNAM. Apartado Postal 20-364 Deleg. Alvaro Obregón 01000, México D.F.
M. Jose Yacaman
Affiliation:
Instituto de Física, UNAM. Apartado Postal 20-364 Deleg. Alvaro Obregón 01000, México D.F.
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Abstract

The surface roughness of small metallic particles and thin films is determined using TEM weak beam dark field images (WBDF) combined with image processing techniques. It is shown that the well known sensitivity of WBDF images to monoatomic steps on the sample surface can be largely improved by the use of image processing. The optimum conditions for step imaging and for the processing for small particles of Au, Pt and Pd and thin films of Au and Ag are discussed. It is found that under most conditions the surface of the particles and the films is very rough at the atomic level in agreement with the current theories of crystal growth.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 82: Symposium I – Characterization of Defects in Materials , 1986 , 475
Copyright
Copyright © Materials Research Society 1987

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References

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