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Characterization of Surfaces and Thin Films by Means of an Ion Microprobe Analyzer

Published online by Cambridge University Press:  28 February 2011

Eiichi Izumi ,
Yoshinori Ikebe ,
Hiroyasu Shichi  and
Hifumi Tamura
Eiichi Izumi
Affiliation:
Naka Works, Hitachi Ltd. 882 Ichige, Katsuta, Ibaraki 312, Japan.
Yoshinori Ikebe
Affiliation:
Naka Works, Hitachi Ltd. 882 Ichige, Katsuta, Ibaraki 312, Japan.
Hiroyasu Shichi
Affiliation:
Central Research Laboratory, Hitachi Ltd. 1-286 Higashi Koigakubo, Kokubunji, Tokyo 185, Japan
Hifumi Tamura
Affiliation:
Central Research Laboratory, Hitachi Ltd. 1-286 Higashi Koigakubo, Kokubunji, Tokyo 185, Japan
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Extract

A variety of materials such as semiconductors, metals, and insulators have been analyzed by use of the Hitachi IMA-3 ion microprobe analyzer. From the depth profile of a GaAs/AQ GaAs superlattice(50Å), a depth resolution of 45Å was obtained at 2350Å below the surface. The stable depth profile of a multilayer plastic film was obtained by using the negative ion beam(O) as a primary ion for charge neutralization. Further, the usefulness of the total ion monitoring method for correcting the changing factors of secondary ion intensity is demonstrated.

Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 75: Symposium B – Photon, Beam, and Plasma Stimulated Chemical Processes at Surfaces , 1986 , 739
Copyright
Copyright © Materials Research Society 1987

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References

1. Hofman, S., Surf. Interface Anal. 2. 148(1980)Google Scholar
2. Werner, H.W., Acta, Electronica. 19,1. 53(1976)Google Scholar
3. Kakibayashi, H. and Nagata, F., J.J.Appl.Phys. 24. L905(1985)Google Scholar
4. Izumi, E. and Tamura, H., Proceedings of the Secondary Ion Mass Spectrometry. SIMS IV. ed.(Beninghoven, A., Okano, J., Shimizu, R., and Werner, H.W.. Springerberg New York Tokyo, 1984) P.141.Google Scholar
5. Storms, H.A., Brown, K.F. and Stein, J.D., Anal. Chen. 49,2023(1977)Google Scholar
6. Magee, C.W. and Honig, R.E., Surf. Interface Anal. 2 35(1982)Google Scholar
7. Hofman, S., in wilson and Wilsons' Comprehensive Anal. Chem. VoI.IX, P89 (1979)Google Scholar
8. Tamura, H., Tadano, J., and Okano, H., Proceeding of the Secondary Ion Mass Spectrometry. SIMS IV. ed.(Beninghoven, A., Okano, J., Shimizu, R. and Werner, H.W.. Springerberg New York Japan, 1984) P498 Google Scholar
9. Tamura, H., Kondo, T., Kanomata, I., Nakamura, K., and Nakajima, Y., J.J.Appl. Phys. supl.2, part 1, 379(1974)Google Scholar