Hostname: page-component-78c5997874-8bhkd Total loading time: 0 Render date: 2024-11-10T10:08:35.922Z Has data issue: false hasContentIssue false
  • English
  • Français

Chemical Vapor Deposition of Binary Metal Germanides

Published online by Cambridge University Press:  21 February 2011

M.J. Hampden-Smith ,
J. Garvey ,
D. Lei  and
J.C. Huffman
M.J. Hampden-Smith
Affiliation:
Department of Chemistry and Center for Micro-Engineered Ceramics, University of New Mexico, Albuquerque, NM 87131.
J. Garvey
Affiliation:
Department of Chemistry and Center for Micro-Engineered Ceramics, University of New Mexico, Albuquerque, NM 87131.
D. Lei
Affiliation:
Department of Chemistry and Center for Micro-Engineered Ceramics, University of New Mexico, Albuquerque, NM 87131.
J.C. Huffman
Affiliation:
Molecular Structure Center, Indiana University, Bloomington IN 47405.
Get access

Abstract

A series of transition metal substituted germacyclopent-3-ene compounds containing transition metal-germanium bonds have been prepared with supporting ligands which are designed to be easily removed either thermally or photochemically. In solution, model thermal decomposition experiments show that either the geramanium or the transition metal substituents may be removed, depending on the nature of the metal. Preliminary hot-wall CVD experiments using manganese and cobalt derivatives result in films with small grain size.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 187: Symposium J – Thin Film Structures and Phase Stability , 1990 , 187
Copyright
Copyright © Materials Research Society 1990

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. West, A.R. in “Solid State Chemistry and its Applications”, J. Wiley and sons, 1984.Google Scholar
2. Chow, T.P. and Steekl, A.J. in“VLSI Electronic Microstructure Science”, Vol.9, Academic Press, 1989.Google Scholar
3. Poerson, H.O., Thin Solid Films, 41, 257, 1977: B.E. Bent, R.G. Nuzzo and C.H. Dubois, J. Amer. Chem. Soc., 111, 1634, 1989.Google Scholar
4. Kolwalczyk, S.P. and Miller, D.L., J. Vac. Sci. Technol., B,3, 1534, 1985.Google Scholar
5. Klassen, R.B. and Baum, T.H., Organomet., 8, 2477, 1989:T.H. Baum and C.R. Jones, Appl. Phys. Lett., 47, 5381, 1985: T.H. Baum and C.R. Jones, J. Vac. Sci. Technol., B, 4J, 1187, 1986: T.H. Baum, E.E. Marinaro and C.R. Jones, Appl. Phys. Lett., 49, 1213, 1986.Google Scholar
6. Gozun, J.E., Pollina, D.M., Jensen, J.A. and Girolami, G.S., Chem. Mater.,1, 8, 1989.Google Scholar
7. Girolami, G.S., Jensen, J.A., Pollina, D.M., Williams, W.S., Kaloyeros, A.E. and Allocca, C.M., J. Amer. Chem. Soc., 107, 1579, 1989.Google Scholar
8. Jensen, G.A., Gozun, J.E., Pollina, D.M. and Girolami, G.S., J. Amer. Chem., Soc., 110, 1643, 1989.Google Scholar
9. Stauff, G.T., Dowben, P.A., Boag, N.M., Morales de la Garza, L. and Dowben, S.L., Thin Solid Films, 156, 327, 1988.Google Scholar
10. Harris, D.C. and Schwartz, R., Mater. Lett., 4, 370, 1986.Google Scholar
11. Gedridge, R.W., Presented at the Fall Meeting MRS Abstr.E9.22, 1988.Google Scholar
12. Bochmann, M., Hawkins, I and Wilson, L.M., J. Chem. Soc., Chem. Commun., 344, 1988.Google Scholar
13. Byne, E.K., Douglas, T., Theopold, K., Presented at the Fall Meeting, MRS Abstr. E2.4: Cowley, A.H., Jones, R.A., Benac, B.L., Kidd, K.B., Ekerdt, J.G. and Miller, J.E., Presented at the Fall Meeting, MRS, Abstr. E2.3. 1988.Google Scholar
14. Lei, D., Hampden-Smith, M.J. Duesler, E.N. and Huffman, J.C., Inorg. Chem., 29, 795, 1990.Google Scholar
15. Lei, D. and Hampden-Smith, M.J., J. Chem. Soc., Chem. Commun., 1211, 1989.Google Scholar