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Chemical Vapor Deposition of Niobium Carbide using a Novel Organometallic Precursor.

Published online by Cambridge University Press:  21 February 2011

Paul D. Stupik ,
Linda K. Cheatham ,
John J. Graham  and
Andrew R. Barron
Paul D. Stupik
Affiliation:
Department of Chemistry, Harvard University, Cambridge, MA 02138
Linda K. Cheatham
Affiliation:
Department of Chemistry, Harvard University, Cambridge, MA 02138
John J. Graham
Affiliation:
Department of Chemistry, Harvard University, Cambridge, MA 02138
Andrew R. Barron
Affiliation:
Department of Chemistry, Harvard University, Cambridge, MA 02138
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Abstract

Chemical vapor deposition from (MeCp)2Nb(allyl) at atmospheric pressure yields niobium carbide films at temperatures as low as 300°C. X-ray photoelectron spectroscopy (XPS) studies indicate that the bulk films contain a carbide phase and a nearly stoichiometric ratio of niobium to carbon. The morphology of the films has been examined by scanning electron microscopy (SEM).

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 168 , 1989 , 363
Copyright
Copyright © Materials Research Society 1990

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