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Published online by Cambridge University Press: 26 February 2011
We explored a new fluid flux stabilized even in the vacuum condition at high temperature by combinatorial pulsed laser deposition (PLD) approach. A small amount of CuO doped in BiOx was found to effectively stabilize BiOx even in 6 Torr O2 at 800°C. The application of this novel Bi-Cu-O flux to the vacuum process lead to the successful fabrication of a single crystal Bi4Ti3O12 film and the establishment of a more reliable process for preparation of an atomically flat LaAlO3(001) substrate.