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Confocal optoelectronic holography microscope for materials and structural characterization of MEMS

Published online by Cambridge University Press:  11 February 2011

Cosme Furlong
Affiliation:
NEST – NanoEngineering, Science, and Technology, CHSLT – Center for Holographic Studies and Laser micro-mechaTronics, Mechanical Engineering Department, Worcester Polytechnic Institute, Worcester, MA 01609, U.S.A.
Adam M. Siegel
Affiliation:
NEST – NanoEngineering, Science, and Technology, CHSLT – Center for Holographic Studies and Laser micro-mechaTronics, Mechanical Engineering Department, Worcester Polytechnic Institute, Worcester, MA 01609, U.S.A.
Ryszard J. Pryputniewicz
Affiliation:
NEST – NanoEngineering, Science, and Technology, CHSLT – Center for Holographic Studies and Laser micro-mechaTronics, Mechanical Engineering Department, Worcester Polytechnic Institute, Worcester, MA 01609, U.S.A.
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Abstract

In this paper, we describe confocal optoelectronic holography microscopy (COEHM) technique specifically being developed for characterizing the shape of MEMS and microelectronics. This is particularly important because shape is directly related to the functionality, performance, and integrity of the microstructures of interest. A specific feature of COEHM is that it allows characterization of high aspect ratio MEMS and microelectronics. Representative applications demonstrating the capabilities of COEHM are presented. It is shown that measurement resolution is highly dependent on the numerical aperture (NA) of the optical components comprising COEHM and on the quality of image digitization. By utilizing optical components characterized by a magnification factor of 50x and a NA of 0.45, measurement resolution of 25 nm is achieved. The resolution is increased to 8 nm when utilizing optical components characterized by a magnification factor of 100x and a NA of 0.73.

Type
Research Article
Copyright
Copyright © Materials Research Society 2003

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References

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