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Controlled Phase Formation by Using a Diffusion Barrier - The Fe-Si REACTION

Published online by Cambridge University Press:  15 February 2011

C.C. Theron ,
A. Falepin ,
S. Degroote ,
J. Dekoster ,
A. Vantomme ,
G. Langouche ,
H.S. De Waal  and
R. Pretorius
C.C. Theron
Affiliation:
Catholic University of Leuven, Dept. of Nuclear and Radiation Physics, Leuven, BELGIUM
A. Falepin
Affiliation:
Catholic University of Leuven, Dept. of Nuclear and Radiation Physics, Leuven, BELGIUM
S. Degroote
Affiliation:
Catholic University of Leuven, Dept. of Nuclear and Radiation Physics, Leuven, BELGIUM
J. Dekoster
Affiliation:
Catholic University of Leuven, Dept. of Nuclear and Radiation Physics, Leuven, BELGIUM
A. Vantomme
Affiliation:
Catholic University of Leuven, Dept. of Nuclear and Radiation Physics, Leuven, BELGIUM
G. Langouche
Affiliation:
Catholic University of Leuven, Dept. of Nuclear and Radiation Physics, Leuven, BELGIUM
H.S. De Waal
Affiliation:
National Accelerator Centre, Van de Graaff Group, Faure, SOUTH AFRICA
R. Pretorius
Affiliation:
National Accelerator Centre, Van de Graaff Group, Faure, SOUTH AFRICA
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Abstract

By analogy to reactive deposition epitaxy and titanium interlayer mediated epitaxy experiments, an attempt has been made to constrain the supply of reactants to the reaction interface in the solid phase reaction between Fe and Si. The goal being to change the normal phase formation sequence by using a suitable diffusion barrier, so that β-FeSi2 forms directly. Both Fe-V and Fe-Zr diffusion barriers were used to constrain the supply of the two reactants during Fe-silicide formation. Measurements with these barriers, show first phase formation of β-FeSi2, but direct formation of 3-FeSi2 as first phase has not been observed. In the case of the Fe-V diffusion barrier it was shown that the use of the diffusion barrier resulted in smoother layers of β-FeSi2 than could be formed by direct reaction of Fe on Si. In the case of the Fe-Zr barrier it is found that the barrier fails structurally at high temperatures. While it does prohibit Fe diffusion at low annealing temperatures, significant Si diffusion occurs prior to ε-FeSi formation.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 580: Symposium E – Nucleation & Growth Processes in Materials , 1999 , 123
Copyright
Copyright © Materials Research Society 2000

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