Hostname: page-component-cd9895bd7-gvvz8 Total loading time: 0 Render date: 2024-12-29T04:45:08.432Z Has data issue: false hasContentIssue false

Copper photoelectrodeposition onto boron doped diamond electrodes at different doping level to enhance nitrate electroreduction.

Published online by Cambridge University Press:  21 February 2012

A. B. Couto
Affiliation:
Instituto Nacional de Pesquisas Espaciais (INPE), 12201-970, São José dos Campos - SP – Brazil.
M. R. Baldan
Affiliation:
Instituto Nacional de Pesquisas Espaciais (INPE), 12201-970, São José dos Campos - SP – Brazil.
N. G. Ferreira
Affiliation:
Instituto Nacional de Pesquisas Espaciais (INPE), 12201-970, São José dos Campos - SP – Brazil.
Get access

Abstract

Photoelectrodeposition of copper on boron-doped diamond films (BDD) was investigated. In this work, two different doped films were analyzed. Copper particles were deposited in the potentiostat mode and under UV irradiation. The BDD film as-grown and the BDD film modifed with Cu (Cu/BDD) on the surface were characterized by Raman Spectroscopy and Scanning Electron Microscopy (SEM) respectivily. These electrodes were tested as electrocatalysts for nitrate reduction in Britton-Robinson buffer solution (pH=3). Electrochemical measurements showed that the electrode with high doping level displayed the best electrocatalytic activity.

Type
Research Article
Copyright
Copyright © Materials Research Society 2012

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

[1] Li, M., Feng, C., Zhang, Z., Yang, S., Sugiura, N., Bioresource Technology 101, 6553 (2010).Google Scholar
[2] Ohmori, T., El-Deab, M. S., Osawa, M., Journal of Electroanalytical Chemistry 470, 46 (1999).Google Scholar
[3] Katsounaros, I., Kyriacou, G., Electrochimica Acta 52, 6412 (2007).Google Scholar
[4] Vooys, A. C. A., van Santen, R. A., van Veen, J. A. R., Journal of molecular Catalysis A: Chemical 154, 203 (2000).Google Scholar
[5] Ndao, A. N., Zenia, F., Deneuville, A., Bernard, M., Lévy-Clément, C., Diamond and Related Materials 9, 1175 (2000).Google Scholar
[6] Lévy-Clément, C., Ndao, N. A., Katty, A., Bernard, M., Deneuville, A., Comninellis, C., Fujishima, A., Diamond and Related Materials 12, 606 (2003).Google Scholar
[7] Welch, C. M., Hyde, M. E., Banks, C. E., Compton, R. G., Analytical Sciences 21, 1421 (2005).Google Scholar
[8] Wu, T., Li, Y., Chu, M., “Photoinduced Metal Deposition on Semiconductor Particles,” Handbook of photochemistry and photobiology, American Scientific Publishers (2003) pp. 249280.Google Scholar
[9] Muret, P., Saby, C., Semicond. Sci. Technol. 19, 1 (2004).Google Scholar
[10] Mendes de Barros, R. C., Corat, E. J., Ferreira, N. G., Souza, T. M., Trava-Airoldi, V. J., Leite, N. F., Iha, K., Diamond Related Materials 5, 1323 (1996).Google Scholar
[11] May, P. W., Ludlow, W. J., Hannaway, M., Heard, P. J., Smith, J. A., Rosser, K. N., Diamond Related Materials 17, 105 (2008).Google Scholar
[12] Bernard, M., Deneuville, A., Muret, P., Diamond Related Materials 13, 282 (2004).Google Scholar
[13] Couto, A. B., Santos, L. C. D., Matsushima, J. T., Baldan, M. R., Ferreira, N. G., Applied Surface Science (2011) (in press).Google Scholar
[14] Zhong, Y. L., Midya, A., Ng, Z., Chen, Z., Daenen, M., Nesladek, M., Loh, K. P., J. Am. Chem. Soc. 130, 17218 (2008).Google Scholar
[15] Aouina, N., Cachet, H., Debiemme-Chouvy, C., Tran, T. T. M., Electrochimica Acta 55, 7341 (2010).Google Scholar