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Crystalline Polyimide Thin Film Deposition by Ionized Cluster Bean

Published online by Cambridge University Press:  25 February 2011

S.J. Cho ,
H.S. Choe ,
H.G. Jang ,
S.S. Iim  and
C.N. Whang
S.J. Cho
Affiliation:
Department of Physics, Kyungseoung University, Busan, 606-020, Korea
H.S. Choe
Affiliation:
Department of Physics, Kyungsang University, Jinju, 660-300, Korea
H.G. Jang
Affiliation:
Department of Physics,Yonsei University, Seoul, 120-749, Korea
S.S. Iim
Affiliation:
Department of Physics,Yonsei University, Seoul, 120-749, Korea
C.N. Whang
Affiliation:
Department of Physics,Yonsei University, Seoul, 120-749, Korea
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Abstract

Polyimide thin films are deposited by the ionized cluster beam deposition( ICBD ) technique. Polymerization and crystallization of polyimide were investigated using TEN, IR, and the electronic structure of the polyimide film was investigated using XPS. Films deposited at optimum ion acceleration voltage showed strong preferential crystal orientation. Crystalline polyimide film was obtained at ion acceleration voltage of 700 V.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 157: Symposium A – Beam-Solid Interactions: Physical Phenomena , 1989 , 49
Copyright
Copyright © Materials Research Society 1990

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References

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