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Defects in HfO2 Based Dielectric Gate Stacks

Published online by Cambridge University Press:  31 January 2011

Patrick M. Lenahan ,
Jason T. Ryan ,
Corey J. Cochrane  and
John F. Conley
Patrick M. Lenahan
Affiliation:
pmlesm@engr.psu.edu, Penn State, University Park, Pennsylvania, United States
Jason T. Ryan
Affiliation:
jtr16@psu.edu, Penn State, University Park, Pennsylvania, United States
Corey J. Cochrane
Affiliation:
corey.cochrane@gmail.com, Penn State, University Park, Pennsylvania, United States
John F. Conley
Affiliation:
jconley@eecs.oregonstate.edu, Oregon State University, Corvallis, Oregon, United States
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Abstract

We report on both conventional electron paramagnetic resonance (EPR) measurements of fully processed HfO2 based dielectric films on silicon and on electrically detected magnetic resonance (EDMR) measurements of fully processed HfO2 based MOSFETs. The magnetic resonance measurements indicate the presence of oxygen vacancy and oxygen interstitial defects within the HfO2 and oxygen deficient silicons in the interfacial layer. The EDMR results also indicate the generation of at least two defects when HfO2 based transistors are subjected to significant negative bias at modest temperature. Our results indicate generation of multiple interface/near interface defects, likely involving coupling with nearby hafnium atoms.

Keywords

defectselectron spin resonancedevices
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1155: Symposium C – CMOS Gate-Stack Scaling–Materials, Interfaces and Reliability Implications , 2009 , 1155-C12-01
Copyright
Copyright © Materials Research Society 2009

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