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Demonstrating the Utility of Boron Based Precursor Molecules for Selective Area DepositIon in a Scanning Tunnelling Microscope

Published online by Cambridge University Press:  25 February 2011

F. Keith Perkins ,
M. Onellion ,
Sunwoo Lee  and
P.A. Dowben
F. Keith Perkins
Affiliation:
The Department of Physics and the Materials Science Program, University of Wisconsin, Madison, Wisconsin 53706
M. Onellion
Affiliation:
The Department of Physics and the Materials Science Program, University of Wisconsin, Madison, Wisconsin 53706
Sunwoo Lee
Affiliation:
The Department of Physics, Syracuse University, Syracuse, New York 13244
P.A. Dowben
Affiliation:
The Department of Physics, Syracuse University, Syracuse, New York 13244
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Abstract

The scanning tunnelling microscope (STM) can be used to selectively deposit material from a gaseous precursor compound. Ultrasmall (less than a 100 nm across) spatial dimensions for selective area deposition may be achieved by this means. In this paper we outline a scheme forselecting and designing main group cluster compounds and organometallics for this type of selective area deposition using nido-decaborane(14) as an example.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 236: Symposium B – Photons and Low Energy Particles in Surface Processing , 1991 , 153
Copyright
Copyright © Materials Research Society 1992

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