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Deposition Of Adherent Diamond Films On Sapphire Substrates

Published online by Cambridge University Press:  15 February 2011

Donald R. Gilbert  and
Rajiv K. Singh
Donald R. Gilbert
Affiliation:
Department of Materials Science and Engineering, University of Florida, Gainesville, FL 32611-2066
Rajiv K. Singh
Affiliation:
Department of Materials Science and Engineering, University of Florida, Gainesville, FL 32611-2066
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Abstract

Sapphire is an important material for infrared-transmission applications and SOI device structures. The use of diamond as a protective coating for sapphire is a desirable, yet elusive process. The primary obstacle to the successful deposition of diamond on sapphire is the large mismatch in thermal expansion characteristics between the two materials. To overcome this problem, we have used a low temperature deposition process involving an electron cyclotron resonance (ECR) assisted plasma CVD system. Continuous, adherent diamond films have been deposited over 1 to 2 cm2 areas. These films have been characterized for structural quality using Raman spectroscopy and x-ray diffraction.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 423: Symposium E – III-Nitride, SiC, and Diamond Materials for Electronic , 1996 , 371
Copyright
Copyright © Materials Research Society 1996

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