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Determination of Diffusion Parameters for Arsenic

Published online by Cambridge University Press:  25 February 2011

Michael Heinrich ,
Matthias Budil  and
Hans W. Pötzl
Michael Heinrich
Affiliation:
TU-Wien, E3598, Gußhausstraße 27-29, A-1040 Wien, Austria
Matthias Budil
Affiliation:
TU-Wien, E3598, Gußhausstraße 27-29, A-1040 Wien, Austria
Hans W. Pötzl
Affiliation:
TU-Wien, E3598, Gußhausstraße 27-29, A-1040 Wien, Austria
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Abstract

This paper deals with an analysis of the oxynitridation and direct nitridation experiments of Fahey et al.(1984[1]). The inconsistencies in the evaluation of the fiactional component of diffusion for aisenic are discussed. Using a recently developed diffusion model an explanation for the diffusion data for arsenic is given. The standard equation for analyzing diffusion under nonequilibrium conditions is shown to lead to erroneous results. A consistent treatment must account for the concentrations of arsenic, point defects and arsenic point defect pairs. Pair formation kinetics must be included. Values are presented for the diffusion constants DIAs, DVAS, and the reaction constants kIAs, kVAs depending on the fractional interstitial component of diffusion .

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 163: Symposium G – Impurities, Defects and Diffusion in Semiconductors: Bulk and Layered Structures , 1989 , 535
Copyright
Copyright © Materials Research Society 1990

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References

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