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Development of Electrodeposited Iridium as a Buffer Layer for YBCO Superconductors
Published online by Cambridge University Press: 01 February 2011
Abstract
Electrodeposition (ED) is a potentially low-cost, non-vacuum, high-rate deposition process that can easily deposit uniform film on large non-planar substrates. In this paper, we report on successful biaxial textured electrodeposition of Ir on Ni-W substrates. Ir metal is well known for its excellent oxidation and corrosion resistance among platinumgroup elements; also, the lattice mismatch of cubic Ir is very close to that of CeO2 and Ni. The films were deposited in a vertical cell in which the electrodes (both working and counter) were suspended vertically from the top of the cell. The ED experiments were performed at 65°C without stirring the solution. The ED precursors were prepared at about -1.2 V from 2 to 15 minutes on Ni-W, where the Pt counter and Pt pseudo-reference electrodes were shorted together. To qualify the electrodeposited Ir buffer layer, a CeO2/YSZ/CeO2 and YSZ/CeO2 buffer structure was later deposited on ED Ir-coated Ni-W substrates by pulsed-laser deposition. The ED Ir/metal substrates were first heated at 800°C in 0.5 mTorr of forming gas, and then a CeO2 seed layer was deposited in 180 mTorr of forming gas. Subsequently, YSZ and CeO2 layers were deposited sequentially in 0.1 mTorr of oxygen.
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- Copyright © Materials Research Society 2005