Hostname: page-component-78c5997874-xbtfd Total loading time: 0 Render date: 2024-11-14T17:22:33.967Z Has data issue: false hasContentIssue false

Direct Observation of Xrd Redox Processes in TMO'S

Published online by Cambridge University Press:  10 February 2011

H. Björk*
Affiliation:
Inorganic Chemistry, Ångström Laboratory, Uppsala University, Box 538, SE-751 21 Uppsala, SWEDEN
T. Gustafsson
Affiliation:
Inorganic Chemistry, Ångström Laboratory, Uppsala University, Box 538, SE-751 21 Uppsala, SWEDEN
J.O. Thomas
Affiliation:
Inorganic Chemistry, Ångström Laboratory, Uppsala University, Box 538, SE-751 21 Uppsala, SWEDEN
*
Corresponding author.: helenb@kemi.uu.se; Tel.: +46 18 471 3717; Fax: +46 18 513548
Get access

Abstract

Accurate XRD, often in combination with ND, has long been used to study electron density features in crystalline compounds. The method is particularly successful for light-atom systems in which the valence-to-core electron ratio is high. The same method is clearly applicable to the study of (typically) lithium insertion/extraction processes in TMO compounds; the greatest hinder has been the availability of sufficiently large single crystals, which do not then disintegrate into micron-size particles during the reaction. The case of V6O13 is especially advantageous in this context, however: millimeter-size crystals can be grown by CVT methods, which do not then exhibit severe cracking on lithium insertion, probably as a result of the layer-like nature of the structure. A sequence of single-crystal phases have now been studied in this way (LixV6O13 for x= 0, 1.0, 2.0 and 3.0) following in situ electrochemical synthesis in the composite cathode of a <Li| PE |V6O13> half-cell. The resulting structures have been solved, and their associated electron-density distributions carefully analysed by so-called Hirshfeld deformation electron density refinement. The method would appear to provide meaningful information relating to oxidation state changes occurring on lithium-ion insertion.

Type
Research Article
Copyright
Copyright © Materials Research Society 1999

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

[1] Murphy, D.W., Christian, P.A., DiSalvo, F.J. and Carides, J.N., J. Electrochem. Soc., 126, 497 (1979).Google Scholar
[2] Aebi, F., Helv. Chim. Acta, 31, 8 (1948).Google Scholar
[3] Wilhelmi, K.A., Waltersson, K. and Kihlborg, L., Acta Chem. Scand., 25, 2675 (1971).Google Scholar
[4] Abraham, K.M., Goldman, J.L. and Dempsey, M.D., J. Electrochem. Soc., 128, 2493 (1981).Google Scholar
[5] West, K., Zachau-Christiansen, B., Jacobsen, T. and Atlung, S., J. Power Sources, 14, 235 (1985).Google Scholar
[6] Gustafsson, T., Thomas, J.O., Koksbang, R. and Farrington, G.C., Electrochim. Acta, 37, 1639 (1992).Google Scholar
[7] Lampe-Önnerud, C., Thomas, J.O., Hardgrave, M. and Yde-Andersen, S., J. Electrochem. Soc., 142, 3648 (1995).Google Scholar
[8] Lampe-Önnerud, C. and Thomas, J.O., Eur. J. Sol. State & Inorg. Chem., 32, 293 (1995).Google Scholar
[9] Chaklanabish, N.C. and Maiti, H.S., J. Thermal Anal., 31, 1243 (1986).Google Scholar
[10] Saeki, M., Kimizuka, N., , Ishii, Kawada, I., Nakano, M., Ichinose, A. and Nakahira, M., J.Cryst. Growth, 18, 101 (1973).Google Scholar
[11] Hirshfeld, F.L., Acta Cryst., B27, 769 (1971).Google Scholar
[12] Lundgren, J.-O., (1983). Crystallographic Computing Programs. Report UUIC-B 13-405. Institute of Chemistry, Univ. of Uppsala, Sweden.Google Scholar
[13] Bergström, Ö., Gustafsson, T. and Thomas, J.O., Acta Cryst., C53, 528 (1997).Google Scholar
[14] Aydinol, M.K., Kohan, A.F., Ceder, G., Cho, K. and Joannopoulos, J., Phys. Rev., B56, 1354 (1997).Google Scholar