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Dynamic Properties of Spectrally Selective Reactively Sputtered Metal Oxides

Published online by Cambridge University Press:  10 May 2013

A.V. Adedeji*
Affiliation:
Department of Chemistry, Geology & Physics, Elizabeth City State University, 1704 Weeksville Road, Elizabeth City, NC 27909, USA
S.D. Worsley
Affiliation:
Department of Chemistry, Geology & Physics, Elizabeth City State University, 1704 Weeksville Road, Elizabeth City, NC 27909, USA
T.L. Baker
Affiliation:
Department of Chemistry, Geology & Physics, Elizabeth City State University, 1704 Weeksville Road, Elizabeth City, NC 27909, USA
R. Mundle
Affiliation:
Center for Materials Research, Norfolk State University, 700 Park Avenue, Norfolk, VA 23504, USA
A.K. Pradhan
Affiliation:
Center for Materials Research, Norfolk State University, 700 Park Avenue, Norfolk, VA 23504, USA
A.C. Ahyi
Affiliation:
Department of Physics, Auburn University, Auburn, AL 36849, USA
T. Isaacs-Smith
Affiliation:
Department of Physics, Auburn University, Auburn, AL 36849, USA
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Abstract

Thin films of Transition Metal Oxides (TMOs) were deposited by reactive sputtering of pure transition metal targets in Argon-Oxygen gas mixture at elevated substrate temperature for efficient energy consumption. The atomic composition and thickness of the TMO films was determined by Rutherford Backscattering Spectroscopy (RBS). Optical transmittance and reflectance spectrum of the films on quartz substrate was measured with thin film measuring system at room temperature and slightly elevated temperature. The surface morphology and structure of the TMO films was determined with Atomic Force Microscope (AFM).

Type
Articles
Copyright
Copyright © Materials Research Society 2013 

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References

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