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The Effect of Gas-Surface Interactions on Laser-Generated BaTiO3 Plumes

Published online by Cambridge University Press:  15 February 2011

Albert J. Paul ,
John W. Hastie ,
David W. Bonnell ,
Peter K. Schenck  and
Mark D. Vaudin
Albert J. Paul
Affiliation:
National Institute of Standards and Technology, Gaithersburg, MD 20899
John W. Hastie
Affiliation:
National Institute of Standards and Technology, Gaithersburg, MD 20899
David W. Bonnell
Affiliation:
National Institute of Standards and Technology, Gaithersburg, MD 20899
Peter K. Schenck
Affiliation:
National Institute of Standards and Technology, Gaithersburg, MD 20899
Mark D. Vaudin
Affiliation:
National Institute of Standards and Technology, Gaithersburg, MD 20899
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Abstract

Two models, based on hydrodynamic and Direct Simulation Monte Carlo approaches, have been investigated for the simulation of species fluxes arriving at substrates during pulsed laser deposition of thin films. The models are assessed in light of the results of mass spectrometric and optical imaging observations of the plume. Model predictions of film composition are compared with the results of microscopic compositional analysis across a deposited BaTiO3 film. The spatial distributions of the relative abundance of total Ba and Ti were a particular focus of this study, with the latter model giving the best agreement with experiment. The Monte Carlo simulation results indicate that the incoming concentration ratio of total Ba to Ti, across the substrate surface, is strongly modified by gas collisions within a compressed region that forms between the infalling plume and the substrate surface, and also by momentum exchange (scattering) between the lighter plume species and the added background gas.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 526: Symposium Y – Advances in Laser Ablation of Materials , 1998 , 243
Copyright
Copyright © Materials Research Society 1998

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References

1. Auciello, O., and Ramesh, R., MRS Bulletin, 21(6), 31–36, June, 1996.Google Scholar
2. NoorBatcha, I., and Lucchese, R., J. Chem. Phys., 86(10), 5816–24, 1987.Google Scholar
3. Chen, K.R., Leboeuf, J.N., Wood, R.F., Geohegan, D.B., Donato, J.M., Lui, C.J., and Puretzky, A.A., Appl. Surf. Sci., 96–98, 45–49, 1996.Google Scholar
4. Capewell, D.L., and Goodwin, D.G., Modeling and Simulation of Thin-Film Processing, MRS Symp. Proc. 389, Eds. Srolovitz, D., Volkert, C.A., Fluss, M.J., Kee, R.J. (MRS, Warrendale, Pa, 1995), p. 367–71.Google Scholar
5. Paul, A.J., Schenck, P.K., Bonnell, D.W., and Hastie, J.W., Film Synthesis and Growth using Energetic Beams, Part 1, MRS Symp. Proc. 388, Eds. Atwater, H.A., Dickinson, J.T., Lowndes, D.H., Polman, A., (MRS, Warrendale, Pa 1995), p. 45–50.Google Scholar
6. Bird, G.A., Molecular Gas Dynamics and the Direct Simulation of Gas Flows, (Oxford University Press, New York. 1994).Google Scholar
7. Hastie, J.W., Bonnell, D.W., and Schenck, P.K., High Temp. Sci., 25, 117, 1988.Google Scholar
8. Hastie, J.W., Paul, A.J., Bonnell, D.W., and Schenck, P.K., Synthesis and Characterization of Advanced Materials, ACS Symp. Series 681, Chapt. 5, Eds. Serio, M.A., Gruen, D.M., and Malhotra, R.. (Amer. Chem. Soc, Washington, DC, 1998), p 39–50.Google Scholar
9. Hastie, J.W., Bonnell, D.W., Paul, A.J., Yeheskel, J., and Schenck, P.K., High Temp. Sci., 33, 135, 1995.Google Scholar
10. Schenck, P.K., Hastie, J.W., Paul, A.J., and Bonnell, D.W., Laser-Induced Thin Film Processing, SPIE Proc 2403, Ed. Dubowski, J.J., (SPIE, Bellingham, WA, 1995), p. 26–38.Google Scholar
11. Schenck, P.K., Vaudin, M., Lee, B.W., Bonnell, D.W., Hastie, J.W., and Paul, A.J., Ferroelectric Thin Films IV, KifS Symp. Proc. 361, Eds. Tuttle, B.A., Desu, S.B., Ramesh, R., Shiosaki, T., (MRS, Warrendale, Pa, 1995), p.527–32.Google Scholar
12 Schenck, P.K., Hastie, J.W., Paul, A.J., and Bonnell, D.W., Opt. Eng., 35(11), 3199–3205, November, 1996.Google Scholar
13. Singh, R.K., and Narayan, J., Phys. Review B., 41(13), 8843–59. May 1, 1990.Google Scholar
14. Chapman, S., and Cowling, T.G., The Mathematical Theory of Non-uniform Gases (3rd Ed.), (Oxford University Press, New York. 1970).Google Scholar
15. Chase, M.W. Jr., Davies, C.A., Downey, J.R. Jr., et al. , “JANAF Thermochemical Tables, Third Ed.” J. Phys. and Chem Ref. Data, (14, Sup. 1), 1985.Google Scholar
16. Hastie, J.W., Bonnell, D.W., Paul, A.J., and Schenck, P.K., Gas-Phase and Surface Chemistry in Electronic Processing, MRS Symp. Proc. 334 Mountziaris, T.J., Paz-Pujalt, G.R., Smith, F.T.J., Westmorland, P.R. (MRS, Warrendale, Pa, 1994) p. 305–316..Google Scholar