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Effect of Metal Back Contacts on Tetrahedral Amorphous Carbonc Films Grown Using the Cathodic Arc Process.

Published online by Cambridge University Press:  21 March 2011

B.S. Satyanarayana ,
H. Takahashi ,
T. Narusawa  and
A. Hiraki
B.S. Satyanarayana
Affiliation:
Also- Sistec Co Ltd, Nankoku-Shi, Kochi, 783 0014, Japan
H. Takahashi
Affiliation:
Electronic and Photonic Systems Engineering Dept.
T. Narusawa
Affiliation:
Electronic and Photonic Systems Engineering Dept.
A. Hiraki
Affiliation:
KUT Academic & Industrial Collaboration Centre, Kochi University of Technology, Kochi, 782–8502, Japan.
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Abstract

Reported here is a study on the effect of different metal back contacts onthe electrical and structural properties of the tetrahedral amorphous carbon (ta-C). The films were grown using a pulsed cathodic arc system. Ta-C films were deposited simultaneously on silicon substrate, precoated with the following metals, namely aluminium (Al), gold (Au), chromium(Cr), molybdenum (Mo), copper (Cu), tungsten (W) and titanium(Ti). The electrical measurements and Raman response show that the back contact does influence the properties of ta-C films. These results are analysed with respect to our earlier report regarding the influence of back contacts on field emission from similar ta-C films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 675: Symposium W – Nanotubes, Fullerenes, Nanostructured and Disordered Carbon , 2001 , W10.2.1
Copyright
Copyright © Materials Research Society 2001

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References

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