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The Effects of Chemical Vapor Cleaning Chemistries on Silicon Surfaces

Published online by Cambridge University Press:  21 February 2011

S.E. Beck ,
A.G. Gilicinski ,
B.S. Felker ,
J.G. Langan ,
D.A. Bohling ,
M.A. George ,
J.C. Tvankovits  and
R.M. Rynders
S.E. Beck
Affiliation:
Air Products and Chemicals, Inc., 7201 Hamilton Blvd., Allentown, PA 18195, USA
A.G. Gilicinski
Affiliation:
Air Products and Chemicals, Inc., 7201 Hamilton Blvd., Allentown, PA 18195, USA
B.S. Felker
Affiliation:
Air Products and Chemicals, Inc., 7201 Hamilton Blvd., Allentown, PA 18195, USA
J.G. Langan
Affiliation:
Air Products and Chemicals, Inc., 7201 Hamilton Blvd., Allentown, PA 18195, USA
D.A. Bohling
Affiliation:
Air Products and Chemicals, Inc., 7201 Hamilton Blvd., Allentown, PA 18195, USA
M.A. George
Affiliation:
Air Products and Chemicals, Inc., 7201 Hamilton Blvd., Allentown, PA 18195, USA
J.C. Tvankovits
Affiliation:
Air Products and Chemicals, Inc., 7201 Hamilton Blvd., Allentown, PA 18195, USA
R.M. Rynders
Affiliation:
Air Products and Chemicals, Inc., 7201 Hamilton Blvd., Allentown, PA 18195, USA
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Abstract

This study explores the effects of two chemical vapor cleaning chemistries on silicon surfaces. The silicon surfaces are not significantly roughened by exposure to either process. Trace amounts of fluorine are found on the surfaces exposed to 1,1,1,5,5,5-hexafluoro-2,4-pentanedione (HFAC). A thin silicon nitride film forms on the silicon surface as a result of exposure to the HMDS process and is attributed to the H2/N2 plasma treatment used in the first step of the process.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 318: Symposium Ca – Interface Control of Electrical, Chemical, and Mechanical Properties , 1993 , 263
Copyright
Copyright © Materials Research Society 1994

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References

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