Hostname: page-component-cd9895bd7-jkksz Total loading time: 0 Render date: 2024-12-28T19:39:43.855Z Has data issue: false hasContentIssue false

Effects of Hydrogen Ion Implantation and Thermal Annealing on Structural and Optical Properties of Single-crystal Sapphire.

Published online by Cambridge University Press:  17 August 2011

William T. Spratt
Affiliation:
College of Nanoscale Science and Engineering, University at Albany-SUNY, Albany, NY 12203, U.S.A.
Mengbing Huang*
Affiliation:
College of Nanoscale Science and Engineering, University at Albany-SUNY, Albany, NY 12203, U.S.A.
Chuanlei Jia
Affiliation:
College of Physics Science and Technology, China University of Petroleum, Dongying, Shandong 257061, P. R. China.
Lei Wang
Affiliation:
School of Physics and Microelectronics, Shandong University, Jinan, Shandong 250100, P. R. China
Vimal K. Kamineni
Affiliation:
College of Nanoscale Science and Engineering, University at Albany-SUNY, Albany, NY 12203, U.S.A.
Alain C. Diebold
Affiliation:
College of Nanoscale Science and Engineering, University at Albany-SUNY, Albany, NY 12203, U.S.A.
Richard Matyi
Affiliation:
College of Nanoscale Science and Engineering, University at Albany-SUNY, Albany, NY 12203, U.S.A.
Hua Xia
Affiliation:
RF and Photonics Laboratory, General Electric Global Research Center, Niskayuna, NY 12309, U.S.A.
Get access

Abstract

Due to its outstanding thermal and chemical stability, single-crystal sapphire is a crucial material for high-temperature optical sensing applications. The potential for using hydrogen ion implantation to fabricate stable, high temperature optical waveguides in single crystal sapphire is investigated in this work. Hydrogen ions were implanted in c-plane sapphire with energies of 35 keV and 1 MeV and fluences 1016-1017/cm2. Subsequent annealing was carried out in air at temperatures ranging from 500˚C to 1200˚C. Complementary techniques were used to characterize the samples, including ellipsometry and prism coupling to examine optical properties, Rutherford backscattering/ion channeling for crystal defects, and nuclear reaction analysis for hydrogen profiling. Several guiding modes were observed in H-implanted (1 MeV) samples annealed above 800˚C through prism coupling, and a maximum index modification of 3% was observed in the 35 keV samples and 1% in the 1 MeV samples through ellipsometry, with the 1 MeV index variation being confirmed through prism coupling. The possible causes of the index modifications, such as H related defects, as well as implications for tailoring the refractive index of sapphire are discussed.

Type
Research Article
Copyright
Copyright © Materials Research Society 2011

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Chen, F, Wang, X, and Wang, K, Optical Materials 29, 15231542 (2007).10.1016/j.optmat.2006.08.001Google Scholar
2. Townsend, P. D., Chandler, P. J., and Zhang, L., Optical Effects of Ion Implantation (Cambridge University Press, Cambridge, 1994) p. 7.10.1017/CBO9780511599781Google Scholar
3. Laversenne, L, Hoffmann, P, and Pollnau, M, Applied Physics Letters 85, 51675169 (2004).10.1063/1.1827336Google Scholar
4. Townsend, P. D., Reports On Progress In Physics 50, 501558 (1987).10.1088/0034-4885/50/5/001Google Scholar
5. Grivas, C., Shepherd, D. P., Eason, R. W., Laversenne, L., Moretti, P., Borca, C. N., and Pollnau, M., Optics Letters 31, 3450 (2006).10.1364/OL.31.003450Google Scholar
6. White, J. M. and Heidrich, P. F., Applied Optics 15, 151 (1976).10.1364/AO.15.000151Google Scholar
7. Sasajima, N, Matsui, T, Furuno, S, Hojou, K, and Otsu, H, Nuclear Instruments and Methods In Physics Research Section B: Beam Interactions With Materials and Atoms 148, 745751 (1999).10.1016/S0168-583X(98)00810-6Google Scholar
8. Ziegler, J F and Biersack, J P computer code SRIM (www.srim.org).Google Scholar
9. Naramoto, H., White, C. W., Williams, J. M., McHargue, C. J., Holland, O. W., Abraham, M. M., and Appleton, B. R., Journal of Applied Physics 54, 683 (1983).10.1063/1.332076Google Scholar
10. Katano, Y, Journal of Nuclear Materials 258-263, 18421847 (1998).10.1016/S0022-3115(98)00410-3Google Scholar
11. Krefft, G. B. and EerNisse, E. P., Journal of Applied Physics 49, 2725 (1978).10.1063/1.325194Google Scholar