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Electrochemical Reactions of Molybdenum Nitride Electrodes in H2SO4 Electrolyte

Published online by Cambridge University Press:  10 February 2011

S. L. Roberson ,
D. Finello  and
R. F. Davis
S. L. Roberson
Affiliation:
U.S. Air Force Palace Knight student attendingNorth Carolina State University
D. Finello
Affiliation:
U.S. Air Force, WL/MNMF, Eglin AFB, FL 32542
R. F. Davis
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Box 7907 Raleigh, NC 27695–7907
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Abstract

The electrochemical reaction of polycrystalline MoxN (x=1 or 2) thin film electrodes in 4.4 M H2SO4 electrolyte has been investigated. The films were prepared by a temperature programmed procedure involving the reaction of MoO3, and NH3 The electrochemical voltage stability of these films in the electrolyte, referenced to a standard hydrogen electrode (SHE), was + 0.70 V (-0.01 to + 0.69). Below + 0.69 V, cyclic voltammetry and AC impedance spectroscopy indicated that MoxN electrodes were capacitive. However, above this value an electrochemical reaction of the MoxN films was observed. The formation of an amorphous phase in the reacted MoxN films was indicated by X-ray diffraction (XRD) patterns. Secondary ion mass spectroscopy (SIMS) detected the presence of hydrogen, oxygen, and sulfur. The voltage bias (+ or -) applied to the electrodes influenced the chemical composition of the reacted MoxN films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 451: Symposium P – Electrochemical Synthesis and Modification , 1996 , 555
Copyright
Copyright © Materials Research Society 1997

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References

REFERENCES

1. Schlatter, J. C., Oyama, S. T., Metcalf, J. E. and Lambert, J. M., Ind. Eng. Chem. Res., 27, p. 1648 (1988).Google Scholar
2. Markel, E. J. and Zee, J. W. V., J. Catal., 126, p. 643 (1990).Google Scholar
3. Anitha, V. P., Major, S., Chandrashekharam, D. and Bhatnagar, M., Surface Coatings and Technology, 79, p. 50 (1996).Google Scholar
4. Rudnik, P. J., Graham, M. E. and Sproul, W. D., Surface Coatings and Technology, 49, p. 293 (1991).Google Scholar
5. Choi, J. G., Choi, D. and Thompson, L. T., J. Mater. Res., 7, p. 374 (1992).Google Scholar
6. Roberson, S. L., Finello, D. and Davis, R. F., MRS Soc. Symp. Proc, Fall 1996 (To be published in the Proceedings of Symp. V), 457.Google Scholar