Hostname: page-component-745bb68f8f-5r2nc Total loading time: 0 Render date: 2025-01-29T23:55:05.007Z Has data issue: false hasContentIssue false
  • English
  • Français

Electroluminescent Oxide Phosphor Thin Films Prepared by a Sol-gel Process

Published online by Cambridge University Press:  14 March 2011

Tadatsugu Minami ,
Toshihiro Miyata ,
Tetsuya Shirai  and
Toshikuni Nakatani
Tadatsugu Minami
Affiliation:
Electron Device System Laboratory, Kanazawa Institute of Technology, 7-1 Ohgigaoka, Nonoichi, Ishikawa 921-8501, Japan
Toshihiro Miyata
Affiliation:
Electron Device System Laboratory, Kanazawa Institute of Technology, 7-1 Ohgigaoka, Nonoichi, Ishikawa 921-8501, Japan
Tetsuya Shirai
Affiliation:
Electron Device System Laboratory, Kanazawa Institute of Technology, 7-1 Ohgigaoka, Nonoichi, Ishikawa 921-8501, Japan
Toshikuni Nakatani
Affiliation:
Electron Device System Laboratory, Kanazawa Institute of Technology, 7-1 Ohgigaoka, Nonoichi, Ishikawa 921-8501, Japan
Get access

Abstract

Ga2O3:Mn and (Ga2O3-SnO2):Eu thin films have been prepared by a sol-gel process. High luminance emissions were obtained in TFEL devices: green using a Ga2O3:Mn and red using a Ga2O3:Eu or a SnO2:Eu thin-film emitting layer. These sol-gel prepared devices were produced without using any vacuum processes and always exhibited higher luminances than equivalent devices prepared by r.f. magnetron sputtering: 40, 309 and above 1000 cd/m2 using SnO2:Eu, Ga2O3:Eu and Ga2O3:Mn phosphor thin films, respectively, in TFEL devices prepared by the sol-gel process and driven at 1kHz.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 621: Symposia Q/R – Electron-Emissive Materials, Vacuum Microelectronics… , 2000 , Q4.3.1
Copyright
Copyright © Materials Research Society 2000

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Minami, T., MRS Symp. Proc. 560, p.47 (1999).Google Scholar
2. Minami, T., Display and Imaging vol.8, suppl. P.83 (1999).Google Scholar
3. Minami, T., Kuroi, Y. and Takata, S., Journal of the SID 4/4, p.299 (1995).Google Scholar
4. Miyata, T., Nakatani, T. and Minami, T., Proc. of the 6th Int. Display Workshops, Sendai, p. 865 (1999).Google Scholar
5. Alt, P.M., Proc. of SID, 25, p.123 (1984).Google Scholar
6. Rack, P.D., Naman, A., Holloway, P.H., Sun, S.S. and Tuenge, R.T., MRS Bulletin 21, p.49 (1996).Google Scholar
7. Minami, T., Kuroi, Y., Sakagami, Y. and Miyata, T., Proc. of the 3rd Int. Display Workshops, Kobe, p.97 (1996).Google Scholar
8. Minami, T., Sakagami, Y. and Miyata, T., Extended Abstract of the 3rd Int. Conf. on the Science and Technology of Display Phosphor, p.37 (1997).Google Scholar
9. Minami, T., Miyata, T. and Sakagami, Y., Surface and Coatings Tech., 108–109, p.594 (1999).Google Scholar
10. Minami, T., Orito, S., Nanto, H. and Takata, S., Proc. of the 6th Int. Display Research Conf. Tokyo, p.140 (1986).Google Scholar
11. Minami, T., Yamada, H., Kubota, Y. and Miyata, T., Jpn. J. Appl. Phys., 36, L1191 (1997).Google Scholar
12. Minami, T., Kubota, Y., Yamada, H., Miyata, T. and Takata, S., Extended Abstract of the 3rd Int. Conf. on the Science and Technology of Display Phosphor, p. 207 (1997).Google Scholar
13. Hartnagel, H.L., Dawar, A.L., Jain, A.K., Jagadish, C., “Semiconducting Transparent Thin Films” Institute of Physics Publishing Bristol and Philadelphia, (1995)Google Scholar
14. “Phosphor Handbook’, ed. Shionoya, S. and William, Y.M. CRC Press (1994).Google Scholar