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Published online by Cambridge University Press: 15 February 2011
The effects of the channel electron density on the interband optical transitions of strained (x = 0.6 and 0.65) and lattice-matched (x = 0.53) lnxGa1−xAs/In0.52Al0.48As/InP high electron mobility transistor structures have been investigated by phototransmittance at room temperature. Analysis of the ground and first excited transitions for low and high densities, respectively, enabled a separate estimation of the electron densities occupying each one of the first two subbands. It was found necessary to include the modulation of the phase-space filling in the analysis of the spectra, especially for the samples with a high electron density, in which case this mechanism becomes dominant.