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Exciting Erbium-Doped Planar Optical Amplifier Materials

Published online by Cambridge University Press:  10 February 2011

A. Polman
A. Polman*
Affiliation:
FOM-Institute for Atomic and Molecular Physics Kruislaan 407, 1098 SJ Amsterdam, The Netherlands
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Abstract

Erbium-doped planar optical amplifiers can find numerous applications in photonic integrated circuits operating at 1.5 μm. The challenge is to fabricate these devices with high gain, operating at low pump power, and having small overall size. In this paper a review is given of our recent work in the area of Er-doped waveguide materials and amplifiers based on three materials classes: oxide films (A12O3, Y2O3, SiO2), polymers, and silicon.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 597: Symposium PP – Thin Films for Optical Waveguide Devices & Materials … , 1999 , 3
Copyright
Copyright © Materials Research Society 2000

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References

1 Miniscalco, W.J., J. Lightwave Technol. 9, 234(1991)Google Scholar
2 Desurvire, E., Erbium-doped fiber amplifiers: principles and applications (John Wiley & Sons, New York, 1994)Google Scholar
3 Huiffner, S., Optical spectra of transparent rear-earth compounds (Academic, New York, 1978)Google Scholar
4 see for a review of earlier work: Polman, A., J. Appl. Phys. 82, 1 (1997)Google Scholar
5 Smit, M.K., Integrated optics in silicon-based aluminium oxide, Ph.D. Thesis (Delft University of Technology, 1991)Google Scholar
6 Hoven, G.N. van den, Polman, A., van Dam, C., Uffelen, J.W.M. van, and Smit, M.K., Appl.Phys. Lett. 68, 1886(1996)Google Scholar
7 Hoven, G.N. van den, Snoeks, E., Polman, A., van Dam, C., Uffelen, J.W.M. van, and Smit, M.K.,J. Appl. Phys. 79, 1258(1996)Google Scholar
8 Kilk, P.G. and Polman, A., to be published.Google Scholar
9 Snoeks, E., G.N. van den Hoven, Polman, A., Hendriksen, B., Diemeer, M.B.J., and Priolo, F., J. Opt. Soc. Am. B 12, 1468(1995)Google Scholar
10 Snoeks, E., Hoven, G.N. van den, and Polman, A., IEEE J. Quantum Electron. 32, 1680(1996)Google Scholar
11 Yan, Y.C., Faber, A.J., Waal, H. de, Kik, P.G., and Polman, A., Appl. Phys. Lett. 71, 2922(1997)Google Scholar
12 Hehlen, M.P., Cockroft, N.J., Gosnell, T.R., Bruce, A.J., Phys. Rev. B 56, 9302(1997)Google Scholar
13 Strohhöfer, Ch., Kik, P.G., and Polman, A., to be publishedGoogle Scholar
14 Ch. Strohhöfer, Kik, P.G., and Polman, A., submitted to J. Appl. Phys. (2000)Google Scholar
15 Min, K.S., Shcheglov, K.V., Yang, C.M., Atwater, H.A., Brongersma, M.L. and Polman, A., Appl.Phys. Lett. 69, 2033(1996)Google Scholar
16 Brongersma, M.L., Kik, P.G., Polman, A., Min, K.S., and Atwater, H.A., Appl. Phys. Lett. 76, 351 (2000)Google Scholar
17 Kovalev, D., Diener, J., Heckler, H., Polisski, G., Ktinzer, N., and Koch, F., Phys. Rev. B 61, 4485 (2000)Google Scholar
18 Kik, P.G., Brongersma, M.L., and Polman, A., Appl. Phys. Lett. 76 (2000), in pressGoogle Scholar
19 Kik, P.G., and Polman, A., submitted to J. Appl. Phys. (2000)Google Scholar
20 Slooff, L.H., Polman, A., Wolbers, M.P. Oude, Veggel, F.C.J.M. van, Reinhoudt, D., and Hofstraat, J.W., J. Appl. Phys. 83, 497(1998)Google Scholar
21 Klink, S.I., Hebbink, G.A., Grave, L., Veggel, F.C.J.M. van, Reinhoudt, D.N., Slooff, L.H., Polman, A., and Hofstraat, J.W., J. Appl. Phys. 86, 1181(1999)Google Scholar
22 Hebbink, G.A. et al, to be publishedGoogle Scholar
23 Slooff, L.H., Polman, A., Klink, S.I., Hebbink, G.A., Grave, L., van Veggel, F.C.J.M., Reinhoudt, D.N., and Hofstraat, J.W., Optical Materials 14, 101(2000)Google Scholar
24 Slooff, L.H., de Dood, M.J.A., van Blaaderen, A., and Polman, A., submitted to Appl. Phys. Lett.(2000)Google Scholar
25 Snoeks, E., Lagendijk, A., and Polman, A., Phys. Rev. Lett. 74, 2460(1995)Google Scholar
26 Hamelin, N., Kik, P.G., Suyver, J.F., Kikoin, K., Polman, A., Schonecker, A., and Saris, F.W., submitted to J. Appl. Phys. (2000)Google Scholar
27 See for a review: Coffa, S., G. Franzò, and Priolo, F., MRS Bulletin 23/4, 25 (1998)Google Scholar
28 j. Michel, Benton, J.L., Ferrante, R.F., Jacobson, D.C., Eaglesham, D.J., Fitzgerald, E.A., Xie, Y.-H., and Kimerling, L.C., J. Appl. Phys. 70, 2667(1991)Google Scholar
29 Priolo, F., Franzò, G., Coffa, S., Polman, A., Libertino, S., Barklie, R., and Carey, D., J. Appl.Phys. 78, 3874(1995)Google Scholar
30 Priolo, F., Franzò, G., Coffa, S., and Camera, A., Phys. Rev. B 57, 4443(1998)Google Scholar
31 Zijlstra, T., Drift, E.W.J.M. van der, de Dood, M.J.A., Snoeks, E., and Polman, A., J. Vac. Sci.Technol. B 17, 2734(1999)Google Scholar
32 Mekis, A., Chen, J.C., Kurland, I., Fan, S., Villeneuve, P.R., and Joannopoulos, J.D., Phys. Rev.Lett. 77, 3787(1996)Google Scholar