Hostname: page-component-cd9895bd7-q99xh Total loading time: 0 Render date: 2024-12-29T12:25:55.875Z Has data issue: false hasContentIssue false

Fundamental Properties and Nano-imprintabilities of Zr-, Pd- and Cu-based Glassy Alloy Thin Films

Published online by Cambridge University Press:  02 February 2011

Kana Takenaka
Affiliation:
RIMCOF-Tohoku Univ. Lab., The Materials Process Technology Center, Katahira 2-1-1, Sendai 980-8577, Japan
Noriko Saidoh
Affiliation:
RIMCOF-Tohoku Univ. Lab., The Materials Process Technology Center, Katahira 2-1-1, Sendai 980-8577, Japan
Nobuyuki Nishiyama
Affiliation:
RIMCOF-Tohoku Univ. Lab., The Materials Process Technology Center, Katahira 2-1-1, Sendai 980-8577, Japan
Akihisa Inoue
Affiliation:
Tohoku Univ., Katahira 2-1-1, Sendai 980-8577, Japan
Get access

Abstract

With the aim of investigating fundamental properties and nano-imprintabilities of glassy alloy in the film form, Zr49Al11Ni8Cu32, Pd39Cu29Ni13P19 and Cu38Zr47Al9Ag6 alloy thin films were fabricated on Si substrate by a magnetron sputtering method. These thin films exhibit distinct glass-tradition phenomenon and large supercooled liquid region of about 80 K, confirming as a glassy structure and have very smooth surface and sufficient hardness to maintain imprinted shape, which are suitable for nano-imprint processing. Moreover, thermal nano-imprintabilies of these obtained films are demonstrated by using a dot array mold with a dot diameter of 90 nm and a pitch of 180 nm. Surface observations revealed that periodic nano-hole arrays were successfully imprinted on the surface of these films and precisely corresponded to the periodic dot pattern of the mold. Particularly, Pd-based glassy alloy thin film indicated more precise pattern imprintability, namely, more flat residual surface plane and sharper hole edge. These results suggest that these glassy alloy thin films, especially Pd-based glassy alloy thin film have high potential for application to the nano-imprinting materials.

Type
Research Article
Copyright
Copyright © Materials Research Society 2011

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Osaka, T., Asahi, T., Kawaji, J. and Yokoshima, T., Electrochim. Acta. 50, 4576 (2005).Google Scholar
2. Nakatani, I., Takahashi, T., Hijikata, M., Fukubayashi, T., Ozawa, K. and Hanaoka, H., Japan patent 1888363, publication JP03–022211A (1991).Google Scholar
3. Chou, S. Y., Krauss, P. R., Zhang, W., Guo, L. and Zhuang, L., J. Vac. Sci. Tech. B15, 2897 (1997).Google Scholar
4. Fernandz, A., Bedrossion, P. J., Baker, S. L., Vernon, S. P. and Kania, D. R., IEEE Trans. Magn. 32, 4472 (1996).Google Scholar
5. Guo, L., J. Adv. Mater. 19, 495 (2007).Google Scholar
6. Inoue, A., Acta Mater. 48, 279 (2000).Google Scholar
7. Saotome, Y., Imai, K., Shioda, S., Shimizu, S., Zhang, T. and Inoue, A., Intermetallics 10, 1241 (2002).Google Scholar
8. Jeong, H. W., Hata, S. and Shimokohbe, A., J. Microelectromechanical Systems 12, 42 (2003).Google Scholar
9. Sharma, P., Kaushik, N., Kimura, H. M., Saotome, Y. and Inoue, A., Nanotechnology 18, 035302 (2007).Google Scholar
10. Takenaka, K., Togashi, N., Nishiyama, N. and Inoue, A., Intermetallics 18, 1969 (2010).Google Scholar
11. Liu, Y., Hata, S., Wada, K. and Shimokohbe, A., J. J. Appl. Phys. 40, 5382 (2001).Google Scholar
12. Inoue, A. and Zhang, T., Mater. Trans. JIM 37, 185 (1996).Google Scholar
13. Inoue, A., Nishiyama, N. and Kimura, H. M., Mater. Trans. JIM 38, 179 (1997).Google Scholar
14. Zhang, Q., Zhang, W. and Inoue, A., Mater. Trans. JIM 48, 629 (2007).Google Scholar
15. Nishiyama, N., Dr Thesis, Tohoku university, 1997.Google Scholar