Hostname: page-component-745bb68f8f-5r2nc Total loading time: 0 Render date: 2025-01-28T10:13:38.800Z Has data issue: false hasContentIssue false
  • English
  • Français

Gas Phase Characterization in LP CVD Processes by a Performant Raman Equipment: Gas Temperature in the Vicinity of the Substrate

Published online by Cambridge University Press:  21 February 2011

R. Gaufres ,
P. Huguet ,
D. Boya  and
J. Lafforet
R. Gaufres
Affiliation:
Laboratorie de Spectroscopie Moléculaire, Université de Montpellier II, 34095 Montpellier Cedex 2, France.
P. Huguet
Affiliation:
Laboratorie de Spectroscopie Moléculaire, Université de Montpellier II, 34095 Montpellier Cedex 2, France.
D. Boya
Affiliation:
Société Comurhex, Division Vapodéposition, BP 29, 26701 Pierrelatte Cedex, France.
J. Lafforet
Affiliation:
Société Comurhex, Division Vapodéposition, BP 29, 26701 Pierrelatte Cedex, France.
Get access

Abstract

Using a performant spontaneous Raman equipment, with intracavity laser excitation, the temperatures of tungsten hexafluoride and hydrogen have been measured in a cell reproducing the industrial conditions of C.V.D. tungsten deposition, in the vicinity of a heated graphite substrate. For tungsten hexafluoride, a vibrational temperature, much lower than that of the substrate, is determined. For hydrogen, rotational temperatures much higher than that of the substrate are found. After a discussion of the sources of experimental errors, possible interpretations of the results are given.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 168 , 1989 , 131
Copyright
Copyright © Materials Research Society 1990

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1.Gaufrbs, R. and Sportouch, S., in Advances in Raman Spectroscopy, Vol. I, edited by Mathieu, J.-P. (Heyden and Son Ltd, London, 1973), p. 478.Google Scholar
2.Gaufr~s, R. and Huguet, P., J. de Physique, Colloques (to be published).Google Scholar
3.Allison, W. and Feuerbacher, B., Phys. Rev. Lett. 45, 2040 (1980).Google Scholar