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A General Approach to Patterning Micron-Scale Particles

Published online by Cambridge University Press:  01 February 2011

Nathanael Sieb  and
Byron D. Gates
Nathanael Sieb
Affiliation:
nsieb@sfu.ca, Simon Fraser University, Department of Chemistry, 8888 University Drive, Burnaby, V5A1S6, Canada
Byron D. Gates
Affiliation:
bgates@sfu.ca, Simon Fraser University, Department of Chemistry, 8888 University Drive, Burnaby, V5A1S6, Canada
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Abstract

Multiple techniques have been developed to assemble micro- or nanostructured materials into well-defined patterns. These techniques are, however, often dependent on the size, shape, composition and/or surface chemistry of the structures being patterned. We have developed a general approach to pattern materials with a wide range of physical and chemical characteristics. We are able to assemble these materials into isolated or interconnected patterns covering areas up to ∼1 mm2.

Keywords

self-assemblymicrostructurecolloid
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 947: Symposium A – Responsive Soft Matter – Chemistry and Physics for Assemblages, Films and Forms , 2006 , 0947-03-24
Copyright
Copyright © Materials Research Society 2007

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References

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