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Germanium Photodetectors for Silicon Microphotonics by Direct Epitaxy on Silicon

Published online by Cambridge University Press:  10 February 2011

Hsin-Chiao Luan ,
Desmond R. Lim ,
Lorenzo Colace ,
Gianlorezo Masini ,
Gaetano Assanto ,
Kazumi Wada  and
Lionel C. Kimerling
Hsin-Chiao Luan
Affiliation:
Department of Materials Science & Engineering, Massachusetts Institute of Technology, Cambridge MA 02139, USA
Desmond R. Lim
Affiliation:
Department of Materials Science & Engineering, Massachusetts Institute of Technology, Cambridge MA 02139, USA
Lorenzo Colace
Affiliation:
Department of Electronic Engineering & National Institute for the Physics of Matter, Terza University of Rome, Via della Vasca Navale 84, 00146 Roma, Italy
Gianlorezo Masini
Affiliation:
Department of Electronic Engineering & National Institute for the Physics of Matter, Terza University of Rome, Via della Vasca Navale 84, 00146 Roma, Italy
Gaetano Assanto
Affiliation:
Department of Electronic Engineering & National Institute for the Physics of Matter, Terza University of Rome, Via della Vasca Navale 84, 00146 Roma, Italy
Kazumi Wada
Affiliation:
Department of Materials Science & Engineering, Massachusetts Institute of Technology, Cambridge MA 02139, USA
Lionel C. Kimerling
Affiliation:
Department of Materials Science & Engineering, Massachusetts Institute of Technology, Cambridge MA 02139, USA
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Abstract

We have grown high-quality Ge epilayers on Si using two-step ultrahigh vacuum/chemical-vapor-deposition followed by post-growth cyclic thermal annealing. Cyclic annealing was effective in reducing threading dislocation densities. The annealing process was improved by optimizing the dislocation velocity. We fabricated and tested metal-semiconductor-metal planar photodetectors using Ge epilayers grown on Si. Our measurement showed an improvement in the photodetector performance as a result of the improved materials quality. The process described in this paper for making high-quality Ge on Si is uncomplicated and can be easily integrated with Si CMOS processes.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 607: Symposium OO – Infrared Applications of Semiconductors III , 1999 , 279
Copyright
Copyright © Materials Research Society 2000

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