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Growth Front Roughening of Room Temperature Deposited Oligomer Thin Films

Published online by Cambridge University Press:  17 March 2011

D. Tsamouras ,
G. Palasantzas ,
J. Th. M. De Hosson  and
G. Hadziioannou
D. Tsamouras
Affiliation:
Department of Polymer Chemistry, Materials Science Center, University of Groningen, Nijenborgh 4, 9747 AG Groningen, The Netherlands
G. Palasantzas
Affiliation:
Department of Applied Physics, Materials Science Center, University of Groningen, Nijenborgh 4, 9747 AG Groningen, The Netherlands
J. Th. M. De Hosson
Affiliation:
Department of Applied Physics, Materials Science Center, University of Groningen, Nijenborgh 4, 9747 AG Groningen, The Netherlands
G. Hadziioannou
Affiliation:
Department of Polymer Chemistry, Materials Science Center, University of Groningen, Nijenborgh 4, 9747 AG Groningen, The Netherlands
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Abstract

Growth front scaling aspects are investigated for PPV-type oligomer thin films vapor- deposited onto silicon substrates at room temperature. For film thickness d~15-300 nm, commonly used in optoelectronic devices, correlation function measurement by atomic force microscopy yields roughness exponents in the range H=0.45±0.04, and an rms roughness amplitude which evolves with film thickness as a power law σ∝ dβ with β=0.28±0.05. The non-Gaussian height distribution and the measured scaling exponents (H and β) suggest a roughening mechanism close to that described by the Kardar-Parisi-Zhang scenario.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 648: Symposium P – Growth, Evolution & Properties of Surfaces, Thin Films, and Self Organized Structure , 2000 , P6.20
Copyright
Copyright © Materials Research Society 2001

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