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High Energy Focused Ion Beam Nanoprobes: Design and Applications

Published online by Cambridge University Press:  26 February 2011

Gary A. Glass ,
Bibhudutta Rout ,
Alexander D. Dymnikov ,
Elia V. Eschenazi ,
Richard Greco  and
Daniel P. Zachry
Gary A. Glass
Affiliation:
glass@louisiana.edu, Louisiana Accelerator Center, United States
Bibhudutta Rout
Affiliation:
bibhu@louisiana.edu, Louisiana Accelerator Center, United States
Alexander D. Dymnikov
Affiliation:
dymnikov@louisiana.edu, Louisiana Accelerator Center, United States
Elia V. Eschenazi
Affiliation:
eeschena@xula.edu, Xavier University of Louisiana, Physics and Dual Degree Engineering, United States
Richard Greco
Affiliation:
rgreco@lanl.gov, Los Alamos National Laboratory
Daniel P. Zachry
Affiliation:
daniel@louisiana.edu, Louisiana Accelerator Center, United States
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Abstract

An overview of the present state of high energy focused ion beam (HEFIB) system technology, nanoprobe system design and specific ion beam writing applications will be presented. In particular, the combination of P-beam, heavy-ion writing and ion implantation to produce microstructures in resists and silicon will be demonstrated.

Heretofore, the development of HEFIB technology worldwide has progressed through a series of developments at independent research facilities, each having relatively narrow and mostly isolated, research purposes. However, a complete, versatile HEFIB nanoprobe system capable of both analysis and modification will require the combination of several component systems, each with specialized technology, and significant advances in the design of a complete system can only be expected from an effort that includes a coordinated development of the component parts.

Keywords

ion-beam processingmicrostructurelithography (removal)
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 908: Symposium OO – Growth, Modification, and Analysis by Ion Beams at the Nanoscale , 2005 , 0908-OO06-01
Copyright
Copyright © Materials Research Society 2006

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References

1 Watt, F., van Kan, J. A., Rajta, I., Bettiol, A. A., Choo, T. F., Breese, M. B. H., Osipowicz, T., Nucl, Instr. Meth. B 210 (2003) 14.Google Scholar
2 Butz, T., Flagmeyer, R. H., Heitmann, J., Jamieson, D. N., Legge, G. J. F., Spemann, D., Szymanski, R., Troger, W., Vogt, J., Zhu, J., Instr. Meth. B 161–163 (2000) 323.Google Scholar
3 Dymnikov, A.D., Yavr, S. Ya, Tekh, Zh.. Fiz 33 (1963) 851; and Sov. Phys. Tech Phys.8 (1964) 639.Google Scholar
4 Szymanski, R., Jamieson, D.N., Nucl, Instr. Meth. B 130 (1997) 80.Google Scholar
5 Glass, G. A., Hollerman, W. A., Hynes, S. F., Fournet, J., Bailey, A. M. and Liao, C., Proceedings of the Sixteenth International Conference on the Application of Accelerators in Research and Industry, November 1-4, 2000, Denton, Texas, American Institute of Physics, 576 (2001), 522.Google Scholar
6 Rout, B., Ghose, S. K., Mohapatra, D. P., Dev, B. N., Bakhru, H., Haberl, A. W., Nucl. Instr, Meth. B. 181 (2001) 110.Google Scholar
7 Enguita, O., Fernandez-Jimenez, M. T., Garcia, G., Climent-Font, A., Calderon, T., Grime, G. W., Nucl. Instr. Meth. B 219–220 (2004) 384.Google Scholar
8 Breese, M. B. H., Jamieson, D. N. and King, P. J. C., Materials Analysis with a Nuclear Microprobe (Wiley, New York, 1996).Google Scholar
9 Butz, T. and Legge, G.J.F.; From micro-to nanoprobes: auspices and horizons, Nucl. Instr. Meth. B113 (1996) 317–322.Google Scholar
10 Breese, M.B.H.; Focused MeV Ion Beams for Materials Analysis and Microfabrication, MRS Bulletin, 25, No. 2 (February 2000)11–12.Google Scholar
11 Alfassi, Zeev B. and Peisach, , Max, , ed.; Elemental Analysis by Particle Accelerators, CRC Press, Boca Raton, FL, 1992.Google Scholar
12 Johansson, Sven A., Campbell, John L., and Malmqvist, Klas G., ed; Particle-Induced Xray Emission Spectrometry (PIXE); John Wiley Sons, Inc., New York, 1995.Google Scholar
13 Chu, Wei-Kan, Mayer, James W., and Nicolet, Marc-A.; Backscattering Spectrometry, Academic Press, Inc., San Diego, CA, 1978.Google Scholar
14 Dymnikov, A.D., Brenner, D.J., Johnson, G. and Randrs-Pehrson, G., Short Electrostatic Lens for the Columbia Microprobe, Rev. Sci. Instr., 71(4) (2000) 1646–1650.Google Scholar
15 Dymnikov, A.D., Hellborg, R., Matrix theory of the motion of a charged particle beam in curvilinear spacetime, Part I. General theory, Nucl. Instr. and Meth. A330, 1993, 323–324.Google Scholar
16 Grime, G.W. and Watt, F., 1983, Beam Optics of Quadrupole Probe-Forming Systems, (Adam Hilger Ltd., Bristol)Google Scholar
17 Menzel, F., Spemann, D., Lenzner, J., Vogt, J., Butz, T., Proton beam writing using the high energy ion nanoprobe LIPSION, Nucl. Instr. Meth. B231 (2005) 372–377.Google Scholar
18 Jamieson, D.N., Rout, B., Szymanski, R., Spizzirri, P., Sakellariou, A., Belcher, W., Ryan, C.G., The new Melbourne nuclear microprobe system, Nucl. Instr. Meth. B190 (2002) 54–59.Google Scholar
19 Watt, F., van Kan, J.A., Rajta, I., Bettiol, A.A., Choo, T.F., Breese, M.B.H., Osipowicz, T., The National University of Singapore high energy ion nano-probe facility: Performance tests, Nucl. Instr. Meth. B210 (2003) 14–20.Google Scholar
20 Bakhru, H., Nickles, E., Haberl, A.W., Nucl. Instr. Meth. B99 (1995) 410.Google Scholar
21 Magnetic Sextuplet as a Zoom Lens for the Nuclear Nanoprobe at the Louisiana Accelerator Center, Dymnikov, A. D. and Glass, G. A., Nuclear Instruments and Methods in Physics Research Section B, Vol. 219–220, pp. 994–999 (2004).Google Scholar
22 Schroeder, J.B, Lunstrum, S.J., Adney, J.R., Phillips, S.H., and Rathmell, R.D.; A high stability accelerator for ion beam diagnostics in a tokamak, Nucl. Instr. Meth. B5657 (1991) 1033–1035.Google Scholar
23 Mouse, D.J.W., Haitsma, R.G., Butz, T., Flagmeyer, F.-H., Lehman, D., and Vogt, J.; The novel ultrastable HVEE 3.5 MV Singletron accelerator for nanoprobe applications, Nucl. Instr. Meth B130 (1997) 31–36.Google Scholar
24 Merveille, C., Sensors and Actuators A 60 (1997) 244–248.Google Scholar
25 Garra, J., Brida, S., Farrario, L., and Paranjape, M., Sensors and Materials, 13(6) (2001) 351–358.Google Scholar
26 Breese, M.B.H., Jamieson, D.N. and King, P.J.C., Materials Analysis Using a Nuclear Microprobe, John Wiley Sons, Inc., New York, NY, 1996.Google Scholar
27 Watt, F., Kan, J.A.van, and Osipowicz, T., MRS Bulletin, 25, No. 2 (2000)33.Google Scholar
28 International Technology Roadmap for Semiconductors 2003 Executive Summary and Lithography chapter. http:public.itrs.netFiles2003ITRSHome2003.htm.Google Scholar
29 Watt, F., Nucl, Instr. Meth. B 158 (1999) 165.Google Scholar
30 Sum, T. C., Bettiol, A. A., van, J. A. Kan, Watt, F., Pun, E. Y. B. and Tung, K. K., Apl. Phys. Lett. 83(9) (2003) 1707.Google Scholar
31 van Kan, J. A., Bettiol, A. A. and Watt, F., Apl. Phys. Lett. 83(8) (2003) 1629.Google Scholar
32 Teo, E.J., Breese, M. B. H., Tavernier, E. P., Bettiol, A. A., Watt, F., Liu, M.H., Blackwood, D. J., Apl. Phys. Lett. 84(16) (2004) 3202 Google Scholar
33 Spemann, D., Han, K. H., Esquinazi, P., Hohne, R., Butz, T., Nucl, Instr. Meth. B 219–220 (2004) 886.Google Scholar
34 Esquinazi, P., Hohne, R., Han, K.-H., Setzer, A., Spemann, D.,Butz, T., Carbon 42 (2004) 1213.Google Scholar
35 Glass, G. A., Rout, B., Dymnikov, A. D., Greco, R. R., Kamal, M.. Reinhardt, J. R., Peeples, J. A., Nucl. Instr. Meth. B (press).Google Scholar
36 Roberts, A., von Bibra, M. L., Lightwave, J. Tech, LT–14 (1996) 2554.Google Scholar
37 Rout, B., Cher, C., Grant, K., Roberts, A., Jamieson, D. N., Proc. SPIE 4935, 172 (2002) - Smart Structures, Devices, and Systems; Erol C. Harvey, Derek Abbott, Vijay K. Varadan; Eds.Google Scholar
38 Watt, F, van Kan, J.A., and Osipowicz, T.; MRS Bulletin 25, No. 2, 33 (2000).Google Scholar
39 Breese, M.B.H.; MRS Bulletin, 25, No. 2 (February 2000) 11.Google Scholar
40 Rout, B., Greco, R. D., Dymnikov, A. D., Reinhardt, J. R., Peeples, J., Kamal, M., Lentz, M., Glass, G. A., Proc. SPIE 5751, (2005) 1050–1057 Emerging Lithographic Technologies IX; R. Scott Mackay; Ed.Google Scholar
41 Glass, G.A., Dymnikov, A. D., Rout, B., Greco, R. R., Dymnikov, A. D., Kamal, M., Peeples, J.A., and Reinhardt, J. R., Proc. 18th International Conference on the Application of Accelerators in Research and Industry, October 11-15, 2004, Fort Worth, TX, Nucl. Instr. Meth. B 241, (In print 2005).Google Scholar
42 Wong, H., Cheung, N. W., Chu, P. K., Liu, J., Mayer, J. W., Appl. Phys. Lett. 52 (1988) 1023.Google Scholar
43 Ion Implantation Technology Proc. of the 15th International Conference on Ion Implantation Technology at Taipei, Taiwan in Oct. 2004, Edited by Chen, Lih J., Poate, John and Lei, Tan-Fu, Nucl, Instr. Meth. B 237 (1-2) (2005).Google Scholar
44 Rout, Bibhudutta, Greco, Richard R., Zachry, Daniel P., Dymnikov, Alexander D., Glass, Gary A. The 13th International Conference on Radiation Effects in Insulators, Santa Fe, NM, 28 August 02 September, 2005. (Proceedings to be published)Google Scholar