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Highly Transparent Arcproof Films for Space Applications

Published online by Cambridge University Press:  10 February 2011

A. J. Adorjan ,
C. Alexander ,
T. L. Blanchard ,
E. Bruckner ,
R. Ferrante ,
S. M. Gajdos ,
K. Mayer ,
A. M. Pal ,
P. A. Walters  and
P. D. Hambourger
...Show all authors
P. D. Hambourger
Affiliation:
Department of Physics, Cleveland State University, Cleveland, OH 44115
S. Rutledge
Affiliation:
NASA Lewis Research Center, Cleveland, OH 44135
Henry Fu
Affiliation:
Ohio Aerospace Institute, Cleveland, OH 44142
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Abstract

Highly transparent films with tailorable sheet resistivity were prepared by ion-beam sputtering of indium tin oxide (ITO) with MgF2 or SiO2 in the presence of high-purity air. Sheet resistivities of 103−101 ohms/square (ω/–) and visible transmittances as high as 92% (not corrected for substrate absorption) were obtained in films ∼30 nm thick. Resistivity increased by as much as two orders of magnitude in the first year after preparation; however, thicker films (e.g. 80 nm) were much more stable but somewhat less transparent. Preliminary data from exposure of film samples to atomic oxygen in a plasma asher indicate minimal degradation in optical properties. Heat-treating pure ITO in air produced transparent, slightly conductive films but with poorer stability of sheet resistivity in air than co-deposited ITO with either SiO2, or MgF2. Electrical transport measurements yielded new information on the electronic properties of ITO and related materials. These films show promise as low-absorption static bleedoff coatings for space photovoltaic arrays as well as CRT faceplates and other commercial applications.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 551: Symposium JJ – Materials in Space-Science, Technology & Exploration , 1998 , 101
Copyright
Copyright © Materials Research Society 1999

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References

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