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High-Temperature Stability of Amorphous Al2O3 Deposited on Si and CeO2-stabilized ZrO2 by Metalorganic Chemical Vapor deposition

Published online by Cambridge University Press:  10 February 2011

J. D. Meyer  and
W. Y. Lee
J. D. Meyer
Affiliation:
Department of Materials Science and Engineering Stevens Institute of Technology, Hoboken, NJ 07030
W. Y. Lee
Affiliation:
Department of Materials Science and Engineering Stevens Institute of Technology, Hoboken, NJ 07030
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Abstract

Aluminum acetylacetonate and water vapor were used to deposit an amorphous A1203 seal coating on Si and CeO2-stabilized ZrO2 (CSZ) produced by air plasma spray. The A1203 coating prepared at ∼500°C was ∼2.5μm thick, uniform, and non-porous. The crystallization and adhesion characteristics of the A1203 coating were examined by thermally annealing the A12 03- coated Si and CSZ substrates in air. The amorphous coating crystallized to metastable A1203 phases within 20 hours at temperatures as low as 700°C. The coating on Si spalled upon annealing whereas the coating on CSZ did not spall, but microcracked extensively due to the significant volume shrinkage associated with crystallization.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 555: Symposium OO – Properties and Processing of Vapor-Deposited Coatings , 1998 , 103
Copyright
Copyright © Materials Research Society 1999

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