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Identification of Constituent Phases Within Thin Metal-Silicide Structures Using Surface X-Ray Diffraction

Published online by Cambridge University Press:  22 February 2011

Harold Jordan ,
K. S. Seeharsha  and
D. W. Chunu
Harold Jordan
Affiliation:
Data General Semiconductor, Sunnyvale, CA 94086-4299
K. S. Seeharsha
Affiliation:
Department of Materials Engineering, San Jose State University San Jose, Ca 95192
D. W. Chunu
Affiliation:
Department of Materials Engineering, San Jose State University San Jose, Ca 95192
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Abstract

A relatively simple technique of surface x-ray diffraction (S-XRD) has been developed for the detection and identification of thin crystalline materials. The technique provides an abundance of diffraction lines with enhanced ability to detect and identify thin phases and to follow the sequence of phase formation within multiple-phase metal silicide structures.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 47: Symposium C – Thin Films: The Relationship of Structure to Properties , 1985 , 175
Copyright
Copyright © Materials Research Society 1985

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References

REFERENCES

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