Hostname: page-component-78c5997874-j824f Total loading time: 0 Render date: 2024-11-14T06:37:33.584Z Has data issue: false hasContentIssue false

Impact of Nitridation on Structural and Optical Properties of Epitaxial GaN Films Grown on M-Plane Sapphire by PAMBE

Published online by Cambridge University Press:  11 February 2015

Shruti Mukundan
Affiliation:
Materials Research Centre, Indian Institute of Science, Bangalore, India.
Lokesh Mohan
Affiliation:
Materials Research Centre, Indian Institute of Science, Bangalore, India.
Greeshma Chandan
Affiliation:
Materials Research Centre, Indian Institute of Science, Bangalore, India.
Basanta Roul
Affiliation:
Materials Research Centre, Indian Institute of Science, Bangalore, India. Central Research Laboratory, Bharat Electronics, Bangalore, India
S.B. Krupanidhi*
Affiliation:
Materials Research Centre, Indian Institute of Science, Bangalore, India.
Get access

Abstract

GaN epilayers were grown on m-plane (10-10) sapphire substrates using plasma assisted molecular beam epitaxy. Impact of nitridation on structural and optical properties of GaN film was investigated. The film grown on a nitridated surface resulted in a nonpolar (10-10) orientation while without nitridation caused a semipolar (11-22) orientation. The high resolution X-ray diffraction studies confirmed the orientation of the GaN films. X-ray rocking curve showed better crystallinity of semipolar as compared to nonpolar GaN. Atomic force microscopy showed smoother films in case of nonpolar GaN which might be in account of the nitridation treatment. Room temperature photoluminescence study showed nonpolar GaN to have higher value of compressive strain as compared to semipolar GaN film, which was further confirmed by room temperature Raman spectroscopy. Despite the fact that it is difficult to obtain high-quality nonpolar material due to the planar anisotropic nature of the growth mode, we hereby report the development of non-polar GaN of usable quality, on an m-plane sapphire, involving controlled steps of nitridation.

Type
Articles
Copyright
Copyright © Materials Research Society 2015 

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

Lin, M. E., Ma, Z., Huang, F. Y., Fan, Z. F., Allen, L. H. and Morkoc, H., Applied Physics Letters 64, 1003 (1994)CrossRefGoogle Scholar
Saito, Wataru, Takada, Yoshiharu, Kuraguchi, Masahiko, Tsuda, Kunio, Omura, Ichiro, Ogura, Tsuneo and Ohashi, Hiromichi, IEEE TRANSACTIONS ON ELECTRON DEVICES, VOL. 50, NO. 12, DECEMBER 2003 Google Scholar
Haase, D., Schmid, M., , W. Kürner, , Dörnen, A., Härle, V., Scholz, F., Burkard, M. and Schweizer, H., Applied Physics Letters 69, 2525 (1996)CrossRefGoogle Scholar
Haskell, B. A., Nakamura, S., DenBaars, S. P., and Speck, J. S., phys. stat. sol.(b) 244, No. 8 (2007) 2847.CrossRefGoogle Scholar
Founta, S., Bougerol, C., Mariette, H., Daudin, B., Vennegues, P., J. Appl. Phys. 102 (2007) 074304.CrossRefGoogle Scholar
Rajpalke, M. K., Roul, B., Kumar, M., Bhat, T. N., Sinha, N. and Krupanidhi, S.B., Scripta Materialia 65 (2011) 33.CrossRefGoogle Scholar
Zhu, T., Martin, D., Grandjean, N., Jpn. J. Appl. Phys. 48 (2009) 020226.CrossRefGoogle Scholar
Paduano, Q. S., Weyburne, D. W., Tomich, D. H., J. Cryst. Growth 367 (2013) 104.CrossRefGoogle Scholar
Matsuoka, T. and Hagiwara, E., phys. stat. sol. (a) 188, No. 2 (2001) 485.3.0.CO;2-#>CrossRefGoogle Scholar
Shao, J., Tang, L., Edmunds, C., Gardner, G., Malis, O., Manfra, M., J. Appl. Phys. 114 (2013) 023508.CrossRefGoogle Scholar
Seo, Y., Lee, S., Jue, M., Yoon, H., Kim, C., Appl. Phys. Exp. 5 (2012) 121001.CrossRefGoogle Scholar
Vennéguès, P., Zhu, T., Martin, D., Grandjean, N., J. Appl. Phys. 108 (2010) 113521.CrossRefGoogle Scholar
Moram, M.A., Johnston, C.F., Kappers, M.J., Humphreys, C.J., J. Phys. D: Appl. Phys. 42, 135407 (2009).CrossRefGoogle Scholar
Heying, B., Wu, X. H., Keller, S., Li, Y., Kapolnek, D., Keller, B. P., DenBaars, S. P. and Speck, J. S., Appl. Phys. Lett. 68, 643 (1996).CrossRefGoogle Scholar
Lee, H., Fujii, K., Goto, T., Yao, T., and Chang, J., Appl. Phys. Lett. 98, 071904 (2011).CrossRefGoogle Scholar
Wang, L., Nathan, M. I., Lim, T., Khan, M. A. and Chen, Q., Appl. Phys. Lett. 68, 1267 (1996).CrossRefGoogle Scholar
Morkoc, H., Handbook of Nitride Semiconductors and Devices, Wiley-VCH (2008).Google Scholar
Tscioglu, I., Aydemir, U. and Altindal, S., J. Appl. Phys. 108, 064506 (2010).CrossRefGoogle Scholar