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In Situ Growth of High Quality Epitaxial Yba2cu3O7‐X Thin Films at Moderate Temperatures by Pulsed Laser Ablation

Published online by Cambridge University Press:  28 February 2011

Douglas H. Lowndes ,
David P. Norton ,
J. W. Mccamy ,
R. Feenstra ,
J. D. Budai ,
D. K. Christen  and
D. B. Poker
Douglas H. Lowndes
Affiliation:
Solid State Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831.
David P. Norton
Affiliation:
Solid State Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831.
J. W. Mccamy
Affiliation:
Solid State Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831.
R. Feenstra
Affiliation:
Solid State Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831.
J. D. Budai
Affiliation:
Solid State Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831.
D. K. Christen
Affiliation:
Solid State Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831.
D. B. Poker
Affiliation:
Solid State Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831.
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Abstract

Pulsed KrF (248 nm) laser ablation has been used for in situ growth of smooth, high‐quality YBa2Cu3O7‐x epitaxial films of variable thickness on SrTiO3, KTaO3, LaGaO3, LaA1O3, cubic ZrO2, and MgO substrates, at temperatures of ∼60O‐730°C, without higher temperature post‐annealing. A rotating target pellet, fine focusing by a single cylindrical lens, laser‐beam scanning over the target, and laser energy densities ∼2.5‐3 J/cm2 can be combined to yield films of completely uniform composition and with ∼25% thickness variation over areas ∼8 cm2. The best films have Tc > 92 K and JC(H = 0, T = 77 K) > 2 MA/cm2. Film‐growth procedures are described, together with results of superconducting and normal‐state transport measurements.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 169: Symposium M – High Temperature Superconductors: Fundamental Properties and Novel Materials Processing , 1989 , 431
Copyright
Copyright © Materials Research Society 1990

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References

1 Feenstra, R., Budai, J. D., Christen, D. K., Chisholm, M. F., Boatner, L. A., Galloway, M. D., and Poker, D. B., in Science and Technology of Thin Film Superconductors (ed. McConnell, R. D. and Wolf, S. A., Plenum Pub. Corp., 1989), p. 327.Google Scholar
2 Terashima, T., Iijima, K., Yamamoto, K., Hirata, K., Bando, Y., and Takada, T., Jap. J. Appl. Physics 28, L987 (1989).Google Scholar
3 Xi, X. X., Linker, G., Meyer, O., Nold, E., Obst, B., Ratzel, F., Smithey, R., Strehlau, B., Weschenfelder, F., and Geerck, J., Z. Phys. B ‐ Conden, Matter 14,13 (1989).Google Scholar
4 Venkatesan, T., Wu, X. D., Inam, A., Hegde, M. S., Chase, E. W., Chang, C. C., England, P., Hwang, D. M., Krchnavek, R., Wachtman, J. B., McLean, W. L., Levi‐Setti, R., Chabala, J., and Wang, Y. L., in Chemistry of High Temperature Superconductors II (Amer. Chem. Soc., 1988), p. 234.Google Scholar
5 Venkatesan, T., Wu, X. D., Inam, A., and Wachtman, J. B., Appl. Phys. Lett. 52, 1193 (1988).Google Scholar
6 Eryu, O., Murakami, K., Masuda, K., Kasuya, A., and Nishina, Y., Appl. Phys. Lett. 54, 2716 (1989).Google Scholar
7 Feenstra, R. et al. , these Proceedings and to be published.Google Scholar
8 McCamy, J. W. et al. , these Proceedings and to be published.Google Scholar
9 Christen, D. K. et al. , these Proceedings and to be published.Google Scholar
10 Tachiki, M. and Takahashi, S., Solid State Comm. 70, 291 (1989).Google Scholar
11 Kwasnick, R. F., Luborsky, F. E., Hall, E. L., Garbauskas, M. F., Borst, K., and Curran, M. J., J. Mater. Res. 4, 257 (1989).Google Scholar
12 Geohegan, D. B. and Mashburn, D. N., these Proceedings and to be published.Google Scholar