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In-Plane Anisotropy In CoCr(Ta,Pt)/Cr Films Deposited onto Substrates with Controlled Topography

Published online by Cambridge University Press:  10 February 2011

D.J. Twisselmann ,
B.T. Adekor ,
M. Farhoud ,
Henry I. Smith ,
P.C. Dorsey  and
C.A. Ross
D.J. Twisselmann
Affiliation:
Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139
B.T. Adekor
Affiliation:
Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139
M. Farhoud
Affiliation:
Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge, MA 02139
Henry I. Smith
Affiliation:
Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge, MA 02139
P.C. Dorsey
Affiliation:
Komag Inc, 1704 Automation Parkway, San Jose, CA 95131
C.A. Ross
Affiliation:
Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139
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Abstract

In-plane magnetic anisotropy can be induced in Cr-underlayer/Co-alloy thin films by grooves or scratches in the substrate. To quantify this effect, silica substrates have been prepared with large areas of submicron grooves using interferometric lithography. The growth of Cr films and Cr/Co-alloy bilayer films on these substrates has been investigated, and in-plane magnetic anisotropy has been observed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 517: Symposium F – Wide Bandgap Semiconductors for High Power, High Frequency , January 1998 , 193
Copyright
Copyright © Materials Research Society 1998

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