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Interconnection Limits on XXI Century Gigascale Integration (GSI)

Published online by Cambridge University Press:  10 February 2011

James D. Meindl
James D. Meindl*
Affiliation:
Microelectronics Research Center, Georgia Institute of Technology 791 Atlantic Drive, N.W. Atlanta, GA 30332–0269
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Extract

Throughout the past four decades, both the productivity and performance of microelectronics technology have advanced at exponential rates. In reality, exponential advances do not continue endlessly. Consequently, the purpose of this discussion is a systematic assessment of early XXI century opportunities for multi-billion transistor chips or gigascale integration (GSI).

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 514: Symposium I – Advanced Interconnects & Contact Materials & Processes for… , 1998 , 3
Copyright
Copyright © Materials Research Society 1998

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References

REFERENCES

[1] Meindl, J.D., “Low Power Microelectronics: Retrospect and Prospect,” Proceeds of the IEEE, Vol.83, No. 4, pp. 619–635, April, 1995.Google Scholar
[2] Sakurai, T., “Approximation of Wiring Delay in MOSFET LSI,” IEEE Trans. Electron Devices, vol. 40, No. 1, pp. 118–124, Jan. 1993.10.1109/16.249433Google Scholar
[3] Private communication, Davis, J., Georgia Institute of Technology, 1998 Google Scholar
[4] Bakoglu, H. B. and Meindl, J.D., “Optimal interconnection circuits for VLSI,” IEEE Trans. Electron Devices, vol. ED–37, pp903–909, May 1985.Google Scholar
[5] Davis, J. A., De, V. K., Meindl, J. D., “A Stochastic Wire-length Distribution for Gigascale Integration (GSI) - Part I: Derivation and Validation,” IEEE Transactions of Electron Devices, vol. 45, no. 3, pp. 580–9, March 1998.10.1109/16.661219Google Scholar