Hostname: page-component-6bf8c574d5-vmclg Total loading time: 0 Render date: 2025-02-22T07:56:09.116Z Has data issue: false hasContentIssue false
  • English
  • Français

Intrinsic Stress in Sputtered Thin Films

Published online by Cambridge University Press:  21 February 2011

Tai D. Nguyen ,
Tue Nguyen  and
James H. Underwood
Tai D. Nguyen
Affiliation:
Center for X-Ray Optics, Lawrence Berkeley Laboratory, University of California, Berkeley, CA 94720
Tue Nguyen
Affiliation:
Sharp Microelectronics Technology, Inc., Camas, WA 98607
James H. Underwood
Affiliation:
Center for X-Ray Optics, Lawrence Berkeley Laboratory, University of California, Berkeley, CA 94720
Get access

Abstract

Understanding of the stress in thin films is important in controls of the properties of nanometer period x-ray multilayers. Stress evolution at the initial stages of thin film formation was studied by molecular dynamics simulation of Mo atoms impinging on a 5×5×5 unit cell Mo substrate. The simulation shows that the structure initially increases in a compressive state. The stress then decreases when the deposited atoms have covered the substrate surface. Measured stress of Ru films in Ru/C multilayers by laser curvature technique shows similar behavior to the simulated results.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 356: Symposium B2 – Thin Films: Stresses and Mechanical Properties V , 1994 , 131
Copyright
Copyright © Materials Research Society 1995

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Thornton, J.A., Tabock, J., and Hoffman, D.W., Thin Solid Films 64 (1979) 111.Google Scholar
2. Hoffman, D.W. and Thornton, J.A., J. Vac. Sci. Tech. 20, 3 (1982) 355.Google Scholar
3. Thornton, J.A., J. Vac. Sci. Tech. A4, 6 (1986) 3059.Google Scholar
4. Itoh, M., Hori, M., and Nadahara, S., J. Vac. Sci. Tech. B9, 1 (1991) 149.Google Scholar
5. Vink, T.J., Somers, M.A.J., Daams, J.L.C., and Dirks, A.G., J. Appl. Phys. 70, 8 (1991) 4301.Google Scholar
6. Nguyen, T.D., in Polycrystalline Thin Films - Structure, Texture, Properties and Applications (MRS Proc. 343, 1994) 579.Google Scholar
7. Ciccotti, G., Hoover, W.G., Molecular Dynamics Simulation of Statistical-Mechanical Systems, North Holland, Amsterdam, 1986.Google Scholar
8. Miller, K.M., J. Phys. F: Metal Physics 11 (1981) 1175.Google Scholar
9. Ding, K., and Andersen, H.C., Phy. Rev. B36 (1987) 2675.Google Scholar
10. Pan, J.T. and Blech, I., J. Appl. Phys. 55 (1984) 2874.Google Scholar
11. Stoney, G.G., Proc. Roy. Soc. Lon. A82 (1909) 72.Google Scholar
12. Nguyen, T.D., Lu, X., and Underwood, J.H., in Physics of X-Ray Multilayer Structures (OSA Tech. Digest Series 6, 1994) 102.Google Scholar
13. Nguyen, T.D., Ph.D. thesis, University of California at Berkeley (1993).Google Scholar