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Investigation of the deformation behavior in nanoindented metal/nitride multilayers by coupling FIB-TEM and AFM observations

Published online by Cambridge University Press:  01 February 2011

G. Abadias
Affiliation:
Laboratoire de Métallurgie Physique, UMR 6630, Université de Poitiers, SP2MI, Téléport 2, 86962 Chasseneuil-Futuroscope, FRANCE
C. Tromas
Affiliation:
Laboratoire de Métallurgie Physique, UMR 6630, Université de Poitiers, SP2MI, Téléport 2, 86962 Chasseneuil-Futuroscope, FRANCE
Y.Y. Tse
Affiliation:
Laboratoire de Métallurgie Physique, UMR 6630, Université de Poitiers, SP2MI, Téléport 2, 86962 Chasseneuil-Futuroscope, FRANCE
A. Michel
Affiliation:
Laboratoire de Métallurgie Physique, UMR 6630, Université de Poitiers, SP2MI, Téléport 2, 86962 Chasseneuil-Futuroscope, FRANCE
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Abstract

Epitaxial TiN/Cu bilayers and multilayers with periods L between 5 and 50 nm have been grown by ultrahigh vacuum ion beam sputtering on Si and MgO(001) substrates at room temperature. The deformation modes induced by a Berkovich nanoindent have been imaged using Focused Ion Beam – Transmission Electron Microscopy (FIB-TEM) and Atomic Force Microscopy (AFM). The observations suggest that the mechanical response of the multilayers is essentially governed by an extensive plastic flow inside the Cu layers, which is confined by a bending of the more rigid TiN layers. This specific deformation behavior, with no contribution of the interfaces as a barrier for dislocation motion could explain the absence of significant hardness enhancement in this system.

Type
Research Article
Copyright
Copyright © Materials Research Society 2005

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