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Ion-Implantation of Reactive Elements in Improving the Adhesion of Thermally Grown Cr2O3 Sales

Published online by Cambridge University Press:  21 February 2011

P. Y. Hou  and
J. Stringer
P. Y. Hou
Affiliation:
Materials and Chemical Sciences Division, Lawrence Berkeley Laboratory, University of California, Berkeley, CA 94720
J. Stringer
Affiliation:
Electric Power Research Institute, Palo Alto, California 94303
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Abstract

The high temperature oxidation behavior of Al, Y and Hf ion-implantation in Ni-25wtCr alloy with dosages ranging from 1015-1017 ions/cm2 has been studied. Results are compared with the unimplanted alloy, a Xe-implanted alloy and alloys with 0.2wt% Y or lwt% Al additions. Oxidation tests were carried out at 1000°C and 1100°C in 1 atm. O2. It is found that the ion-implantation of Y and Hf greatly reduced oxidation rate and improved scale adherence after a critical implantation dosage, ∼ l×1016 ions/cm2, has been reached. The improved scale adhesion is attributed to both a reduction in growth stress and a strengthened scale/alloy interface, which all developed as a result of a modified scale growth process.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 119: Symposium F – Adhesions in Solids , 1988 , 205
Copyright
Copyright © Materials Research Society 1988

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