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Island Structured Dielectric Thin Films by Scalable Self-Assembly
Published online by Cambridge University Press: 01 February 2011
Abstract
A self-assembly driven process to synthesize island-structured dielectric films is presented. An intermetallic reaction in platinized silicon substrates provides preferential growth sites for the complex oxide dielectric (strontium-doped lead zirconate titanate) layer. Microscopy and spectroscopy analyses have been used to propose a mechanism for this structuring process. This provides a simple and scalable process to synthesize films with increased surface area for sensors, especially those materials with a complex chemistry.
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- Research Article
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- Copyright © Materials Research Society 2010