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Laser Pointing Stability Measured by an Oblique-incidence Optical Transmittance Difference Technique

Published online by Cambridge University Press:  15 February 2011

J. Gray ,
P. Thomas  and
X.D. Zhu
J. Gray
Affiliation:
Department of Physics, University of California, Davis Davis, CA 95616, U.S.A.
P. Thomas
Affiliation:
Department of Physics, University of California, Davis Davis, CA 95616, U.S.A.
X.D. Zhu
Affiliation:
Department of Physics, University of California, Davis Davis, CA 95616, U.S.A.
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Abstract

We describe an oblique incidence optical transmittance difference technique for determining the pointing stability of a laser. In this technique, we follow the angular drift a monochromatic laser beam by measuring the relative changes in transmittance through a parallel fused quartz window for s- and p- polarized components of the beam in response to the drift. This method is shown in the present experiment to have the sensitivity to detect angular changes in the range of 1.7 νradians. To demonstrate the technique we measured the angular drifts of two commercially available lasers.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 780: Symposium Y – Advanced Optical Processing of Materials , 2003 , Y1.9
Copyright
Copyright © Materials Research Society 2003

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References

1. Lasers and Laser-Related Equipment, Test Methods for Laser Beam Parameters, Beam Positional Stability (International Organization for Standardization, Geneva, Switzerland, 1999) ISO/DIS 11670.Google Scholar
2. Maestle, R., Plass, W., Chen, J., Hembd-Soellner, Chr., A, Giesen, Tiziani, H., Hugel, H.: Proc. Soc. Photo-Opt. Instrum. Eng. 2870, 319 (1996) and references therein.Google Scholar
3. Leveque, M., Mailloux, A., Morin, M., Galarneau, P., Champagne, Y., Plomteux, O. and Tiedtke, M., Proc. SPIE 3773, 158 (1999)Google Scholar
4. Qian, S., Takacs, P.: Proc. Soc. Photo-Opt. Instrum. Eng. 3773, 206 (1999)Google Scholar
5. Azzam, R.M.A. and Bashara, N.M., Ellipsometry and Polarized Light (North-Holland, Amsterdam, 1977)Google Scholar
6. Wong, A. and Zhu, X.D., Appl. Phys. A: Mater. Sci. Process. 63, 1 (1996)Google Scholar
7. Zhu, X.D., Lu, H.B., Yang, G.-Z, Li, Z.-Y, Gu, B.-Y., Zhang, D.-Z., Phys. Rev. B. 57, 4, 2514 (1998)Google Scholar
8. Zhu, X.D. and Nabighian, E., Appl. Phys. Lett. 73, 2736 (1998)Google Scholar
9. Zhu, X.D., Si, W., Xi, X. X., Li, Q., Jiang, Q.D., and Medici, M.G., Appl. Phys. Lett. 74, 3540 (1999)Google Scholar
10. Zhu, X.D., Si, W., Xi, X.X., and Jiang, Q.D., Appl. Phys. Lett. 78, 460 (2001)Google Scholar
11. Gray, J., Thomas, P. and Zhu, X.D., Rev. Sci. Instrum. 72, 9, (2001)Google Scholar