Hostname: page-component-78c5997874-j824f Total loading time: 0 Render date: 2024-11-10T09:00:42.155Z Has data issue: false hasContentIssue false

Laser Shot Peening of Inconel 600 and Surface Morphology Characterization

Published online by Cambridge University Press:  01 February 2011

A. A. Bugayev
Affiliation:
Applied Research Center, Old Dominion University, 12050 Jefferson Avenue, Newport News, Virginia 23606, U.S.A.
M. C. Gupta
Affiliation:
Applied Research Center, Old Dominion University, 12050 Jefferson Avenue, Newport News, Virginia 23606, U.S.A.
J. Orr
Affiliation:
Framatome ANP, Inc, Lynchburg, Virginia 24506, U.S.A.
S. Levesque
Affiliation:
Framatome ANP, Inc, Lynchburg, Virginia 24506, U.S.A.
R. Payne
Affiliation:
Framatome ANP, Inc, Lynchburg, Virginia 24506, U.S.A.
Get access

Abstract

The results on laser shot peening and its characterization for Inconel 600 are presented. Using an X-ray diffraction technique we show that the residual compressive stresses can be successfully induced in Inconel 600 with parameters of laser peening, which are close to that of 316L stainless steel. The on-line monitoring system involving the acoustic pulse measurements is described for quality control of laser shot peening process. We found that sample scanning during laser processing results in a system of column-like microstructure, which is tilted in direction of scanning. The features of optical properties of tilted microstructure are described. We revealed that the base material injected into the confining water due to laser ablation is transformed to spherical nanoparticles with diameter of 60 nm.

Type
Research Article
Copyright
Copyright © Materials Research Society 2005

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Gerland, M., Hallouin, M., Presles, H. N., Material Science and Engineering 156A, 175 (1992).Google Scholar
2. Sano, Y., Mukai, N., Okasaki, K., Obata, M., Nucl. Instr. and Meth. in Phys. Res. B121, 432 (1997).Google Scholar
3. Obata, M., Sano, Y., Mukai, N., Yoda, M., Shima, A, and Kanno, M., Proc. of the 7th International Conference on Shot Peening (ICSP7), Warsaw, Poland, 1987, p.387 Google Scholar
4. Peyre, P., Fabro, R., Berthe, L. and Dubouchet, C., J. of Laser Application 8, 135 (1996).Google Scholar
5. Peyre, P., Berthe, L., Scherpereel, X., Fabbro, R., and Bartnicki, E., J. of Appl. Phys. 84, 5985 (1998).Google Scholar
6. Fabbro, R., Fournier, J., Ballard, P., Devaux, D., and Virmont, J., J. Appl. Phys. 68, 775 (1990).Google Scholar
7. Fabbro, R., Peyre, P., Berthe, L., and Scherpereel, X., J. of Laser Application 10, 265 (1998).Google Scholar
8. Devaux, D., Fabbro, R., Tollier, L., and Bartnicki, E., J. Appl. Phys. 74, 2268 (1993).Google Scholar
9. Peyre, P., Fabbro, R., Optical and Quantum Electronics 27, 1213 (1995).Google Scholar
10. Akhmanov, S. A., Emelyanov, V. I., Koroteev, N. I., and Seminogov, V. N., Usp. Fiz. Nauk 147, 675 (1985) [Sov. Phys. Usp. 28, 1084 (1985)].Google Scholar
11. Bugayev, A. A., Lukoshkin, V. A., Urpin, V. A., and Yakovlev, D. G., Zh. Tekh. Fiz. 58, 908 (1988) [Sov. Phys. Tech. Phys. 33, 550 (1988)].Google Scholar
12. Sanchez, F., Morenza, J. L., Aquiar, R., Deldago, J. C., Varela, M., Appl. Phys. A 60, 83 (1998).Google Scholar
13. Dolgayev, S. I., Lavrishev, S. V., Lyalin, A. A., Simakin, A. V., Voronov, V. V., Shafeev, G. A., Appl. Phys. A 73, 177 (2001)Google Scholar
14. Klug, H. P., Alexander, L. E, X-ray Diffraction Procedures, (John Wiley & Sons, 1973), New York, Chichester, Brisbane, Toronto, Singapur, 966 p.Google Scholar
15. Grevey, D., Maiffredy, L., Vannes, A., Journal of Material Science 27, 2110 (1992)Google Scholar
16. Cai, H., Chandhary, N., Lee, J., Becker, M. F., Brock, J. R., Keto, J. W.. Journal of Aerosol Science and Technology 29 627 (1998).Google Scholar
17. Miotello, A., Bonetti, M., De Marchi, G., Mattei, G., Mazzoldi, P., Sada, C., Conella, F., Appl. Phys. Lett. 79, 24562458 (2001)Google Scholar