Hostname: page-component-78c5997874-m6dg7 Total loading time: 0 Render date: 2024-11-13T02:16:30.648Z Has data issue: false hasContentIssue false

Lateral InxGa1−x, P Heterostructures Obtained by Single Step Growth on Pre-Patterned Substrate by Chemical Beam Epitaxy

Published online by Cambridge University Press:  10 February 2011

M.P.P. de Castro
Affiliation:
Departamento de Fisica Aplicada, LPD- Universidade Estadual de Campinas- São Paulo, Brasil
J. Betitni
Affiliation:
Departamento de Fisica Aplicada, LPD- Universidade Estadual de Campinas- São Paulo, Brasil
C.A. Ribeiro
Affiliation:
Departamento de Fisica Aplicada, LPD- Universidade Estadual de Campinas- São Paulo, Brasil
M.M. Carvalho
Affiliation:
Departamento de Fisica Aplicada, LPD- Universidade Estadual de Campinas- São Paulo, Brasil
N.C. Frateschi
Affiliation:
Departamento de Fisica Aplicada, LPD- Universidade Estadual de Campinas- São Paulo, Brasil
Get access

Abstract

We present an investigation on the spatial compositional variation in InGaP layers grown by chemical beam epitaxy (CBE) on pre-patterned substrates. Neighboring regions with 190 meV bandgap discontinuity are observed with the growth at 500°C. The development of laser structures on V-grooves that incorporate these lateral heterostructures is achieved by controlling the growth temperature during growth

Type
Research Article
Copyright
Copyright © Materials Research Society 1999

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

[1] Scott, M.D., Riffat, J.R, Griffith, I., Davies, J.I. and Marshall, A.C., J. Crystal Growth 93, 820 (1988).Google Scholar
[2] Guha, S., Madhukar, A., Kaviani, K., Chen, L., Kapre, R., Hyugaji, M. and Xie, Z., Mat. Res. Soc. Symp. Proc. 145, 27 (1989).Google Scholar
[3] Arent, D.J., Nilsson, S., Galeuchet, Y.D., Meir, H.P. and Walter, W., Appl. Phys. Lett. 55, 2611 (1989).Google Scholar
[4] Krahl, M., Kapon, E., Schiavone, L.M., Gaag, B.P. Van der, Harbison, J.P., and Florez, L.T., Appl. Phys. Lett. 61, 813 (1992).Google Scholar
[5] Sugira, H., Nishida, T., Iga, R., Yamada, T. and Tamamura, T., J. Crystal 121, 579 (1992).Google Scholar
[6] Castro, M.P.P. de, Frateschi, N.C., Bettini, J., Carvalho, M. M. de, J. Crystal Growth 193, 510 (1998).Google Scholar
[7] Castro, M.P.P. de, Frateschi, N.C., Bettini, J., Carvalho, M. M. de, in press, J. Crystal Growth (1999).Google Scholar
[8] Ozasa, K., Yuri, M., Tanaka, S. and Matsumani, H., J. Appl. Phys. 68, 107 (1990).Google Scholar