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Localized Charge Trapping Memory Cells in a 63 nm Generation with Nanoscale Epitaxial Cobalt Salicide Buried Bitlines

Published online by Cambridge University Press:  01 February 2011

Torsten Mueller ,
C. Kleint ,
C. Fitz ,
M. Isler ,
S. Riedel ,
J.-U. Sachse ,
D. Olligs ,
H. Boubekeur ,
F. Heinrichsdorf  and
V. Polei
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Torsten Mueller
Affiliation:
Torsten.Mueller1@qimonda.com, Qimonda Dresden GmbH & Co. OHG, Flash Technology Development, Koenigsbruecker Strasse 180, Dresden, 01099, Germany, +49 351 886 7913, +49 351 886 6996
C. Kleint
Affiliation:
Christoph.Kleint@qimonda.com, Qimonda, Koenigsbruecker Strasse 180, Dresden, 01099, Germany
C. Fitz
Affiliation:
Clemens.Fitz@qimonda.com, Qimonda, Koenigsbruecker Strasse 180, Dresden, 01099, Germany
M. Isler
Affiliation:
Mark.Isler@qimonda.com, Qimonda, Koenigsbruecker Strasse 180, Dresden, 01099, Germany
S. Riedel
Affiliation:
Stephan.Riedel@qimonda.com, Qimonda, Koenigsbruecker Strasse 180, Dresden, 01099, Germany
J.-U. Sachse
Affiliation:
Jens-Uwe.Sachse@qimonda.com, Qimonda, Koenigsbruecker Strasse 180, Dresden, 01099, Germany
D. Olligs
Affiliation:
Dominik.Olligs@qimonda.com, Qimonda, Koenigsbruecker Strasse 180, Dresden, 01099, Germany
H. Boubekeur
Affiliation:
Hocine.Boubekeur@qimonda.com, Qimonda, Koenigsbruecker Strasse 180, Dresden, 01099, Germany
F. Heinrichsdorf
Affiliation:
Frank.Heinrichsdorf@qimonda.com, Qimonda, Koenigsbruecker Strasse 180, Dresden, 01099, Germany
V. Polei
Affiliation:
Veronika.Polei@infineon.com, Infineon Technologies, Dresden, 01099, Germany
D. Pritchard
Affiliation:
David.Pritchard@qimonda.com, Qimonda, Koenigsbruecker Strasse 180, Dresden, 01099, Germany
M. Verhoeven
Affiliation:
Martin.Verhoeven@qimonda.com, Qimonda, Koenigsbruecker Strasse 180, Dresden, 01099, Germany
L. Lattard
Affiliation:
Ludivic.Lattard@qimonda.com, Qimonda, Koenigsbruecker Strasse 180, Dresden, 01099, Germany
M. Markert
Affiliation:
Matthias.Markert@qimonda.com, Qimonda, Koenigsbruecker Strasse 180, Dresden, 01099, Germany
C. Schupke
Affiliation:
Christin.Schupke@qimonda.com, Qimonda, Koenigsbruecker Strasse 180, Dresden, 01099, Germany
B. Tippelt
Affiliation:
Birgit.Tippelt@qimonda.com, Qimonda, Koenigsbruecker Strasse 180, Dresden 01099, Germany
S. Teichert
Affiliation:
Steffen.Teichert@qimonda.com, Qimonda, Koenigsbruecker Strasse 180, Dresden 01099, Germany
R. Reisdorf
Affiliation:
Ralf.Reisdorf@qimonda.com, Qimonda, Koenigsbruecker Strasse 180, Dresden 01099, Germany
C. Ludwig
Affiliation:
Christoph.Ludwig@qimonda.com, Qimonda, Koenigsbruecker Strasse 180, Dresden 01099, Germany
E.G. Stein v. Kamienski
Affiliation:
Elard.Stein@qimonda.com, Qimonda, Koenigsbruecker Strasse 180, Dresden 01099, Germany
T. Mikolajick
Affiliation:
Thomas.Mikolajick@ikw.tu-freiberg.de, Qimonda, Koenigsbruecker Strasse 180, Dresden 01099, Germany
N. Nagel
Affiliation:
Nicolas.Nagel@qimonda.com, Qimonda, Koenigsbruecker Strasse 180, Dresden 01099, Germany
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Abstract

A 63nm Twin Flash memory cell with a size of 0.0225μm2 per 2 (or 4) bits is presented. To achieve small cell areas, a buried bit line and an aggressive gate length of 100 nm are the key features of this cell together with a minimum thermal budget processing. A novel epitaxial CoSi2 process allows the salicidation of local buried bitlines with only a few tens of nanometer width.

Keywords

memorydevicesepitaxy
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 997: Symposium I – Materials and Processes for Nonvolatile Memories II , 2007 , 0997-I02-10
Copyright
Copyright © Materials Research Society 2007

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References

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