Hostname: page-component-78c5997874-m6dg7 Total loading time: 0 Render date: 2024-11-10T14:14:47.639Z Has data issue: false hasContentIssue false
  • English
  • Français

Luminescence Properties in Er,O-codoped GaAs Light-Emitting Devices with Double Excitation Mechanism

Published online by Cambridge University Press:  01 February 2011

Yasufumi Fujiwara ,
Kei Fujii ,
Ayafumi Fujita ,
Yuji Ota ,
Yoshiaki Ito ,
Takashi Kawasaki ,
Kota Noguchi ,
Takahiro Tsuji ,
Atsushi Nishikawa  and
Yoshikazu Terai
Yasufumi Fujiwara
Affiliation:
fujiwara@mat.eng.osaka-u.ac.jp, Osaka University, Division of Materials and Manufacturing Science, Graduate School of Engineering, Osaka, Japan
Kei Fujii
Affiliation:
kei.fujii@mat.eng.osaka-u.ac.jp, Osaka University, Division of Materials and Manufacturing Science, Graduate School of Engineering, Osaka, Japan
Ayafumi Fujita
Affiliation:
Ayafumi.fujita@mat.eng.osaka-u.ac.jp, Osaka University, Division of Materials and Manufacturing Science, Graduate School of Engineering, Osaka, Japan
Yuji Ota
Affiliation:
yuji.ota@mat.eng.osaka-u.ac.jp, Osaka University, Division of Materials and Manufacturing Science, Graduate School of Engineering, Osaka, Japan
Yoshiaki Ito
Affiliation:
Yoshiaki.Ito@mat.eng.osaka-u.ac.jp, Osaka University, Division of Materials and Manufacturing Science, Graduate School of Engineering, Osaka, Japan
Takashi Kawasaki
Affiliation:
Takashi.kawasaki@mat.eng.osaka-u.ac.jp, Osaka University, Division of Materials and Manufacturing Science, Graduate School of Engineering, Osaka, Japan
Kota Noguchi
Affiliation:
Kota/noguchi@mat.eng.osaka-u.ac.jp, Osaka University, Division of Materials and Manufacturing Science, Graduate School of Engineering, Osaka, Japan
Takahiro Tsuji
Affiliation:
Takahiro.tsuji@mat.eng.osaka-u.ac.jp, Osaka University, Division of Materials and Manufacturing Science, Graduate School of Engineering, Osaka, Japan
Atsushi Nishikawa
Affiliation:
nishikawa@mat.eng.osaka-u.ac.jp, Osaka University, Division of Materials and Manufacturing Science, Graduate School of Engineering, Osaka, Japan
Yoshikazu Terai
Affiliation:
y-terai@mat.eng.osaka-u.ac.jp, Osaka University, Division of Materials and Manufacturing Science, Graduate School of Engineering, Osaka, Japan
Get access

Abstract

We fabricated a laser diode (LD) exhibiting a lasing from strained GaInAs quantum wells (QWs) embedded in Er,O-codoped GaAs (GaAs:Er,O) by organometallic vapor phase epitaxy (OMVPE). The lasing wavelength was designed to tune to the energy separation between the second excited states 4I11/2 and the ground state 4I15/2 of Er3+ ions. The threshold current for the lasing at room temperature was six times larger than that of a GaInAs QW-LD without Er doping, reflecting ultrafast carrier capture by an Er-related trap in GaAs:Er,O. The Er intensity revealed initially steep increase with injected current density in the region for spontaneous emission from the GaInAs QWs. In the stimulated QW emission region, the intensity continued to increase with the current density.

Keywords

ErluminescenceIII-V
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1111: Symposium D – Rare-Earth Doping of Advanced Materials for Photonic Applications , 2008 , 1111-D01-02
Copyright
Copyright © Materials Research Society 2009

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. For example, Fujiwara, Y., Ofuchi, H., Tabuchi, M., Takeda, Y., InP and Related Compounds - Materials, Applications and Devices-, Optoelectronic Properties of Semiconductors and Superlattices, Vol. 9, edited by Manasreh, M. O. (Gordon and Breach Science Pub., The Netherlands, 2000) pp. 251–311.Google Scholar
2. Takahei, K., Taguchi, A., J. Appl. Phys. 74, 1979 (1993).Google Scholar
3. Takahei, K., Taguchi, A., Horikoshi, Y., Nakata, J., J. Appl. Phys. 76, 4332 (1994).Google Scholar
4. Koizumi, A., Fujiwara, Y., Inoue, K., Urakami, A., Yoshikane, T., Takeda, Y., Jpn. J. Appl. Phys. 42, 2223 (2003).Google Scholar
5. Fujiwara, Y., Takemoto, S., Nakamura, K., Shimada, K., Suzuki, M., Hidaka, K., Terai, Y. and Tonouchi, M., Physica B 401–402, 234 (2007).Google Scholar
6. Terai, Y., Hidaka, K., Fujii, K., Takemoto, S., Tonouchi, M. and Fujiwara, Y., Appl. Phys. Lett. (in press)Google Scholar
7. Hogg, R. A., Takahei, K., and Taguchi, A., J. Appl. Phys. 79, 8682 (1996).Google Scholar