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Luminescent Colloidal Silicon Nanocrystals Prepared by Nanoseconds Laser Fragmentation and Laser Ablation in Water

Published online by Cambridge University Press:  01 February 2011

Vladimir Svrcek ,
Davide Mariotti ,
Richard Hailstone ,
Hiroyuki Fujiwara  and
Michio Kondo
Vladimir Svrcek
Affiliation:
vladimir.svrcek@aist.go.jp, National Institute of Advanced Industrial Science and Technology (AIST), Research Center for Photovoltaics, Central 2, Umezono 1-1-1,, Tsukuba, 305-8568, Japan, 81-29-861-5429, 81-29-861-3367
Davide Mariotti
Affiliation:
dxmemc@rit.edu, Kate Gleason College of Engineering Rochester Institute of Technology, Department of Microelectronic Engineering, 82 Lomb Memorial Drive, Rochester, NY, NY 14623, United States
Richard Hailstone
Affiliation:
dxailstone@rit.edu, Chester F. Carlson Center for Imaging Science, Rochester Institute of Technology,, Department of Microelectronic Engineering, 54 Lomb Memorial Drive,, Rochester, NY, NY 14623, United States
Hiroyuki Fujiwara
Affiliation:
hiro-fujiwara@aist.go.jp, National Institute of Advanced Industrial Science and Technology (AIST), Research Center for Photovoltaics, Central 2, Umezono 1-1-1,, Tsukuba, 305-8568, Japan
Michio Kondo
Affiliation:
mhkondo@tkg.att.ne.jp, National Institute of Advanced Industrial Science and Technology (AIST), Research Center for Photovoltaics, Central 2, Umezono 1-1-1,, Tsukuba, 305-8568, Japan
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Abstract

The surface states of silicon nanocrystals (Si-ncs) considerably affect quantum confinement effects and may determinate final nanocrystals properties. Colloidally dispersed Si-ncs offer larger freedom for surface modification compared to common plasma enhanced chemical vapor deposition or epitaxial synthesis in a solid matrix. The Si-ncs fabrication and elaboration in water by pulsed laser processing is an attractive alternative for controlling and engineering of nanocrystal surface by environmentally compatible way. We report on the possibility of direct silicon surface ablation and Si-ncs fabrication by nanosecond pulsed laser fragmentation of electrochemically etched Si micrograins and by laser ablation of crystalline silicon target immersed in de-ionized water. Two nanosecond pulsed lasers (Nd:YAG, and excimer KrF) are successfully employed to assure fragmentation and ablation in order to produce silicon nanoparticles. Contrary to the fragmentation process, which is more efficient under Nd:YAG irradiation, the laser ablation by both lasers led to the fabrication of fine and room temperature photoluminescent Si-ncs. The processing that has natural compatibility with the environment and advanced state of fabrication technologies may imply new possibilities and applications.

Keywords

luminescencelaser ablationnanoscale
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1066: Symposium A – Amorphous and Polycrystalline Thin-Film Silicon Science and Technology—2008 , 2008 , 1066-A18-10
Copyright
Copyright © Materials Research Society 2008

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References

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